A novel copper precursor for electron beam induced deposition

A fluorine free copper precursor, Cu(tbaoac)(2) with the chemical sum formula CuC(16)O(6)H(26) is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microsc...

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Detalles Bibliográficos
Autores principales: Haverkamp, Caspar, Sarau, George, Polyakov, Mikhail N, Utke, Ivo, Puydinger dos Santos, Marcos V, Christiansen, Silke, Höflich, Katja
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2018
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5942376/
https://www.ncbi.nlm.nih.gov/pubmed/29765799
http://dx.doi.org/10.3762/bjnano.9.113

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5942376/
https://www.ncbi.nlm.nih.gov/pubmed/29765799
http://dx.doi.org/10.3762/bjnano.9.113

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