Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process

The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE proce...

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Detalles Bibliográficos
Autores principales: Sun, Laixi, Shao, Ting, Shi, Zhaohua, Huang, Jin, Ye, Xin, Jiang, Xiaodong, Wu, Weidong, Yang, Liming, Zheng, Wanguo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5951461/
https://www.ncbi.nlm.nih.gov/pubmed/29642571
http://dx.doi.org/10.3390/ma11040577

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5951461/
https://www.ncbi.nlm.nih.gov/pubmed/29642571
http://dx.doi.org/10.3390/ma11040577

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