Thermal hysteresis measurement of the VO(2) emissivity and its application in thermal rectification

Hysteresis loops in the emissivity of VO(2) thin films grown on sapphire and silicon substrates by a pulsed laser deposition process are experimentally measured through the thermal-wave resonant cavity technique. Remarkable variations of about 43% are observed in the emissivity of both VO(2) films,...

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Detalles Bibliográficos
Autores principales: Gomez-Heredia, C. L., Ramirez-Rincon, J. A., Ordonez-Miranda, J., Ares, O., Alvarado-Gil, J. J., Champeaux, C., Dumas-Bouchiat, F., Ezzahri, Y., Joulain, K.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5981426/
https://www.ncbi.nlm.nih.gov/pubmed/29855507
http://dx.doi.org/10.1038/s41598-018-26687-9

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