UV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume

Pulsed Laser Deposition is a commonly used non-equilibrium physical deposition technique for the growth of complex oxide thin films. A wide range of parameters is known to influence the properties of the used samples and thin films, especially the oxygen-vacancy concentration. One parameter has up t...

Descripción completa

Detalles Bibliográficos
Autores principales: Hensling, F. V. E., Keeble, D. J., Zhu, J., Brose, S., Xu, C., Gunkel, F., Danylyuk, S., Nonnenmann, S. S., Egger, W., Dittmann, R.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5996021/
https://www.ncbi.nlm.nih.gov/pubmed/29892095
http://dx.doi.org/10.1038/s41598-018-27207-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5996021/
https://www.ncbi.nlm.nih.gov/pubmed/29892095
http://dx.doi.org/10.1038/s41598-018-27207-5

Ejemplares similares