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UV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume
Pulsed Laser Deposition is a commonly used non-equilibrium physical deposition technique for the growth of complex oxide thin films. A wide range of parameters is known to influence the properties of the used samples and thin films, especially the oxygen-vacancy concentration. One parameter has up t...
Autores principales: | Hensling, F. V. E., Keeble, D. J., Zhu, J., Brose, S., Xu, C., Gunkel, F., Danylyuk, S., Nonnenmann, S. S., Egger, W., Dittmann, R. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5996021/ https://www.ncbi.nlm.nih.gov/pubmed/29892095 http://dx.doi.org/10.1038/s41598-018-27207-5 |
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