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Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors
Monolayers of transition metal dichalcogenides (TMDC) have recently emerged as excellent platforms for exploiting new physics and applications relying on electronic valley degrees of freedom in two-dimensional (2D) systems. Here, we demonstrate that Coulomb screening by 2D carriers plays a critical...
Autores principales: | , , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6030139/ https://www.ncbi.nlm.nih.gov/pubmed/29968719 http://dx.doi.org/10.1038/s41467-018-04988-x |
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author | Miyauchi, Yuhei Konabe, Satoru Wang, Feijiu Zhang, Wenjin Hwang, Alexander Hasegawa, Yusuke Zhou, Lizhong Mouri, Shinichiro Toh, Minglin Eda, Goki Matsuda, Kazunari |
author_facet | Miyauchi, Yuhei Konabe, Satoru Wang, Feijiu Zhang, Wenjin Hwang, Alexander Hasegawa, Yusuke Zhou, Lizhong Mouri, Shinichiro Toh, Minglin Eda, Goki Matsuda, Kazunari |
author_sort | Miyauchi, Yuhei |
collection | PubMed |
description | Monolayers of transition metal dichalcogenides (TMDC) have recently emerged as excellent platforms for exploiting new physics and applications relying on electronic valley degrees of freedom in two-dimensional (2D) systems. Here, we demonstrate that Coulomb screening by 2D carriers plays a critical role in excitonic valley pseudospin relaxation processes in naturally carrier-doped WSe(2) monolayers (1L-WSe(2)). The exciton valley relaxation times were examined using polarization- and time-resolved photoluminescence spectroscopy at temperatures ranging from 10 to 160 K. We show that the temperature-dependent exciton valley relaxation times in 1L-WSe(2) under various exciton and carrier densities can be understood using a unified framework of intervalley exciton scattering via momentum-dependent long-range electron–hole exchange interactions screened by 2D carriers that depend on the carrier density and the exciton linewidth. Moreover, the developed framework was successfully applied to engineer the valley polarization of excitons in 1L-WSe(2). These findings may facilitate the development of TMDC-based opto-valleytronic devices. |
format | Online Article Text |
id | pubmed-6030139 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-60301392018-07-05 Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors Miyauchi, Yuhei Konabe, Satoru Wang, Feijiu Zhang, Wenjin Hwang, Alexander Hasegawa, Yusuke Zhou, Lizhong Mouri, Shinichiro Toh, Minglin Eda, Goki Matsuda, Kazunari Nat Commun Article Monolayers of transition metal dichalcogenides (TMDC) have recently emerged as excellent platforms for exploiting new physics and applications relying on electronic valley degrees of freedom in two-dimensional (2D) systems. Here, we demonstrate that Coulomb screening by 2D carriers plays a critical role in excitonic valley pseudospin relaxation processes in naturally carrier-doped WSe(2) monolayers (1L-WSe(2)). The exciton valley relaxation times were examined using polarization- and time-resolved photoluminescence spectroscopy at temperatures ranging from 10 to 160 K. We show that the temperature-dependent exciton valley relaxation times in 1L-WSe(2) under various exciton and carrier densities can be understood using a unified framework of intervalley exciton scattering via momentum-dependent long-range electron–hole exchange interactions screened by 2D carriers that depend on the carrier density and the exciton linewidth. Moreover, the developed framework was successfully applied to engineer the valley polarization of excitons in 1L-WSe(2). These findings may facilitate the development of TMDC-based opto-valleytronic devices. Nature Publishing Group UK 2018-07-03 /pmc/articles/PMC6030139/ /pubmed/29968719 http://dx.doi.org/10.1038/s41467-018-04988-x Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Miyauchi, Yuhei Konabe, Satoru Wang, Feijiu Zhang, Wenjin Hwang, Alexander Hasegawa, Yusuke Zhou, Lizhong Mouri, Shinichiro Toh, Minglin Eda, Goki Matsuda, Kazunari Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors |
title | Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors |
title_full | Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors |
title_fullStr | Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors |
title_full_unstemmed | Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors |
title_short | Evidence for line width and carrier screening effects on excitonic valley relaxation in 2D semiconductors |
title_sort | evidence for line width and carrier screening effects on excitonic valley relaxation in 2d semiconductors |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6030139/ https://www.ncbi.nlm.nih.gov/pubmed/29968719 http://dx.doi.org/10.1038/s41467-018-04988-x |
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