Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution

A novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H(3)PO(4) solution are thinly and uniformly distributed on copper surfa...

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Detalles Bibliográficos
Autores principales: Hu, Shuai, Chen, Zhenyu, Guo, Xingpeng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6073992/
https://www.ncbi.nlm.nih.gov/pubmed/30018205
http://dx.doi.org/10.3390/ma11071225
Descripción
Sumario:A novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H(3)PO(4) solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu(3)(PO(4))(2) nanoflowers. The anticorrosion properties of 1-dodecanethiol SAM on copper surface and on copper surface that is treated with H(3)PO(4) solution were evaluated. Results demonstrated that 1-dodecanethiol SAM on bare copper surface exhibits good protection capacity, whereas a copper surface that is pretreated with H(3)PO(4) solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAM.

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