Alignment Method for Linear-Scale Projection Lithography Based on CCD Image Analysis

This paper presents a method to improve the alignment accuracy of a mask in linear scale projection lithography, in which the adjacent pixel gray square variance method is applied to a charge-coupled device (CCD) image to obtain the best position of the focal length of the motherboard and then reali...

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Detalles Bibliográficos
Autores principales: Ren, Dongxu, Zhao, Zexiang, Xi, Jianpu, Li, Bin, Li, Zhengfeng, Zhao, Huiying, Cui, Lujun, Xu, Hang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6111620/
https://www.ncbi.nlm.nih.gov/pubmed/30060479
http://dx.doi.org/10.3390/s18082442

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6111620/
https://www.ncbi.nlm.nih.gov/pubmed/30060479
http://dx.doi.org/10.3390/s18082442

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