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Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6113288/ https://www.ncbi.nlm.nih.gov/pubmed/30154484 http://dx.doi.org/10.1038/s41467-018-05788-z |
| _version_ | 1783350987115724800 |
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| author | Gil-Santos, Eduardo Baker, Christopher Lemaître, Aristide Ducci, Sara Gomez, Carmen Leo, Giuseppe Favero, Ivan |
| author_facet | Gil-Santos, Eduardo Baker, Christopher Lemaître, Aristide Ducci, Sara Gomez, Carmen Leo, Giuseppe Favero, Ivan |
| author_sort | Gil-Santos, Eduardo |
| collection | PubMed |
| description | |
| format | Online Article Text |
| id | pubmed-6113288 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2018 |
| publisher | Nature Publishing Group UK |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-61132882018-08-30 Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching Gil-Santos, Eduardo Baker, Christopher Lemaître, Aristide Ducci, Sara Gomez, Carmen Leo, Giuseppe Favero, Ivan Nat Commun Author Correction Nature Publishing Group UK 2018-08-28 /pmc/articles/PMC6113288/ /pubmed/30154484 http://dx.doi.org/10.1038/s41467-018-05788-z Text en © The Author(s) 2018 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
| spellingShingle | Author Correction Gil-Santos, Eduardo Baker, Christopher Lemaître, Aristide Ducci, Sara Gomez, Carmen Leo, Giuseppe Favero, Ivan Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| title | Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| title_full | Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| title_fullStr | Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| title_full_unstemmed | Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| title_short | Author Correction: Scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| title_sort | author correction: scalable high-precision tuning of photonic resonators by resonant cavity-enhanced photoelectrochemical etching |
| topic | Author Correction |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6113288/ https://www.ncbi.nlm.nih.gov/pubmed/30154484 http://dx.doi.org/10.1038/s41467-018-05788-z |
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