TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature

Depleted uranium (DU) is oxidized readily due to its chemical activities, which limits its applications in nuclear industry. TiN film has been applied widely due to its good mechanical properties and its excellent corrosion resistance. In this work, TiN protection films were deposited on DU by direc...

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Detalles Bibliográficos
Autores principales: Ding, Jingjing, Yin, Xixi, Fang, Liping, Meng, Xiandong, Yin, Anyi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6119904/
https://www.ncbi.nlm.nih.gov/pubmed/30103416
http://dx.doi.org/10.3390/ma11081400

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6119904/
https://www.ncbi.nlm.nih.gov/pubmed/30103416
http://dx.doi.org/10.3390/ma11081400

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