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Oriented Attachment and Nanorod Formation in Atomic Layer Deposition of TiO(2) on Graphene Nanoplatelets

[Image: see text] Understanding the spontaneous organization of atoms on well-defined surfaces promises to enable control over the shape and size of supported nanostructures. Atomic layer deposition (ALD) boasts atomic-scale control in the synthesis of thin films and nanoparticles. Yet, the possibil...

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Detalles Bibliográficos
Autores principales: Grillo, Fabio, La Zara, Damiano, Mulder, Paul, Kreutzer, Michiel T., Ruud van Ommen, J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2018
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6120748/
https://www.ncbi.nlm.nih.gov/pubmed/30197725
http://dx.doi.org/10.1021/acs.jpcc.8b05572
Descripción
Sumario:[Image: see text] Understanding the spontaneous organization of atoms on well-defined surfaces promises to enable control over the shape and size of supported nanostructures. Atomic layer deposition (ALD) boasts atomic-scale control in the synthesis of thin films and nanoparticles. Yet, the possibility to control the shape of ALD-grown nanostructures remains mostly unexplored. Here, we report on the bottom-up formation of both linear and V-shaped anatase TiO(2) nanorods (NRs) on graphene nanoplatelets during TiCl(4)/H(2)O ALD carried out at 300 °C. NRs as large as 200 nm form after only five ALD cycles, indicating that diffusional processes rather than layer-by-layer growth are behind the NR formation. In particular, high-resolution transmission electron microscopy reveals that the TiO(2) NRs and graphene nanoplatelets are in rotational alignment as a result of lattice matching. Crucially, we also show that individual nanocrystals can undergo in-plane oriented attachment.