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A quick convergent-beam laboratory X-ray reflectometer using a simultaneous multiple-angle dispersive geometry

An X-ray reflectometer using a laboratory X-ray source for quick measurements of the specular X-ray reflectivity curve is presented. It uses a bent–twisted crystal to monochromatize and focus the diverging X-rays (Cu Kα(1)) from a laboratory point source onto the sample. The reflected X-rays are rec...

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Detalles Bibliográficos
Autores principales: Voegeli, Wolfgang, Kamezawa, Chika, Arakawa, Etsuo, Yano, Yohko F., Shirasawa, Tetsuroh, Takahashi, Toshio, Matsushita, Tadashi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6157822/
https://www.ncbi.nlm.nih.gov/pubmed/30319318
http://dx.doi.org/10.1107/S1600576717002461
Descripción
Sumario:An X-ray reflectometer using a laboratory X-ray source for quick measurements of the specular X-ray reflectivity curve is presented. It uses a bent–twisted crystal to monochromatize and focus the diverging X-rays (Cu Kα(1)) from a laboratory point source onto the sample. The reflected X-rays are recorded with a two-dimensional detector. Reflectivity curves can be measured without rotating the sample, detector or X-ray source during measurements. The instrument can separate the specularly reflected X-rays from the diffuse scattering background, so low reflectivities can be measured accurately. For a gold thin film on silicon, the reflectivity down to the order of 10(−6) was obtained with a measurement time of 100 s and that down to 10(−5) with a measurement time of 10 s. Reflectivity curves of a silicon wafer and a liquid ethylene glycol surface are shown as well. Time-resolved measurements of a TiO(2) surface during UV irradiation are also reported.