Multiscale Analysis of Size Effect of Surface Pit Defect in Nanoindentation

The nanoindentation on a pit surface has been simulated using the quasicontinuum method in order to investigate the size effect of surface pit defect on the yield load of thin film. Various widths and heights of surface pit defect have been taken into account. The size coefficient has been defined as an index to express the influence of the width or height of surface pit defect. The results show that as the size coefficient of width (of height) increases, at first the yield load of thin film decreases extremely slowly, until the size coefficient of width equals approximately one unit (half unit), at which point the yield load experiences an obvious drop. When the size coefficient of width (of height) reaches approximately two units (one unit), the yield load is almost the same as that of the nanoindentation on a stepped surface. In addition, the height of surface pit defect has more influence than the width on the yield load of thin film.