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Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187693/ https://www.ncbi.nlm.nih.gov/pubmed/30424326 http://dx.doi.org/10.3390/mi9080393 |
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author | Lin, Yen-Nan Dai, Ching-Liang |
author_facet | Lin, Yen-Nan Dai, Ching-Liang |
author_sort | Lin, Yen-Nan |
collection | PubMed |
description | Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field (MF) in the x-axis and y-axis, and four Hall elements are used to sense MF in the z-axis. In addition to emitter, bases and collectors, additional collectors are added to the magnetotransistor. The additional collectors enhance bias current and carrier number, so that the sensor sensitivity is enlarged. The MMF sensor fabrication is easy because it does not require post-CMOS processing. Experiments depict that the MMF sensor sensitivity is 0.69 V/T in the x-axis MF and its sensitivity is 0.55 V/T in the y-axis MF. |
format | Online Article Text |
id | pubmed-6187693 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-61876932018-11-01 Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process Lin, Yen-Nan Dai, Ching-Liang Micromachines (Basel) Article Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field (MF) in the x-axis and y-axis, and four Hall elements are used to sense MF in the z-axis. In addition to emitter, bases and collectors, additional collectors are added to the magnetotransistor. The additional collectors enhance bias current and carrier number, so that the sensor sensitivity is enlarged. The MMF sensor fabrication is easy because it does not require post-CMOS processing. Experiments depict that the MMF sensor sensitivity is 0.69 V/T in the x-axis MF and its sensitivity is 0.55 V/T in the y-axis MF. MDPI 2018-08-07 /pmc/articles/PMC6187693/ /pubmed/30424326 http://dx.doi.org/10.3390/mi9080393 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Lin, Yen-Nan Dai, Ching-Liang Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process |
title | Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process |
title_full | Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process |
title_fullStr | Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process |
title_full_unstemmed | Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process |
title_short | Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process |
title_sort | micro magnetic field sensors manufactured using a standard 0.18-μm cmos process |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187693/ https://www.ncbi.nlm.nih.gov/pubmed/30424326 http://dx.doi.org/10.3390/mi9080393 |
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