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Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process

Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field...

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Detalles Bibliográficos
Autores principales: Lin, Yen-Nan, Dai, Ching-Liang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187693/
https://www.ncbi.nlm.nih.gov/pubmed/30424326
http://dx.doi.org/10.3390/mi9080393
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author Lin, Yen-Nan
Dai, Ching-Liang
author_facet Lin, Yen-Nan
Dai, Ching-Liang
author_sort Lin, Yen-Nan
collection PubMed
description Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field (MF) in the x-axis and y-axis, and four Hall elements are used to sense MF in the z-axis. In addition to emitter, bases and collectors, additional collectors are added to the magnetotransistor. The additional collectors enhance bias current and carrier number, so that the sensor sensitivity is enlarged. The MMF sensor fabrication is easy because it does not require post-CMOS processing. Experiments depict that the MMF sensor sensitivity is 0.69 V/T in the x-axis MF and its sensitivity is 0.55 V/T in the y-axis MF.
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spelling pubmed-61876932018-11-01 Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process Lin, Yen-Nan Dai, Ching-Liang Micromachines (Basel) Article Micro magnetic field (MMF) sensors developed employing complementary metal oxide semiconductor (CMOS) technology are investigated. The MMF sensors, which are a three-axis sensing type, include a magnetotransistor and four Hall elements. The magnetotransistor is utilized to detect the magnetic field (MF) in the x-axis and y-axis, and four Hall elements are used to sense MF in the z-axis. In addition to emitter, bases and collectors, additional collectors are added to the magnetotransistor. The additional collectors enhance bias current and carrier number, so that the sensor sensitivity is enlarged. The MMF sensor fabrication is easy because it does not require post-CMOS processing. Experiments depict that the MMF sensor sensitivity is 0.69 V/T in the x-axis MF and its sensitivity is 0.55 V/T in the y-axis MF. MDPI 2018-08-07 /pmc/articles/PMC6187693/ /pubmed/30424326 http://dx.doi.org/10.3390/mi9080393 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Lin, Yen-Nan
Dai, Ching-Liang
Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
title Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
title_full Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
title_fullStr Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
title_full_unstemmed Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
title_short Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS Process
title_sort micro magnetic field sensors manufactured using a standard 0.18-μm cmos process
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6187693/
https://www.ncbi.nlm.nih.gov/pubmed/30424326
http://dx.doi.org/10.3390/mi9080393
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