Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

The rapid development of nanotechnologies and sciences has led to the great demand for novel lithography methods allowing large area, low cost and high resolution nano fabrications. Characterized by unique sub-diffraction optical features like propagation with an ultra-short wavelength and great fie...

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Detalles Bibliográficos
Autores principales: Wang, Changtao, Zhang, Wei, Zhao, Zeyu, Wang, Yanqin, Gao, Ping, Luo, Yunfei, Luo, Xiangang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6189824/
https://www.ncbi.nlm.nih.gov/pubmed/30404291
http://dx.doi.org/10.3390/mi7070118

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6189824/
https://www.ncbi.nlm.nih.gov/pubmed/30404291
http://dx.doi.org/10.3390/mi7070118

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