Solvent-Free Patterning of Colloidal Quantum Dot Films Utilizing Shape Memory Polymers

Colloidal quantum dots (QDs) with properties that can be tuned by size, shape, and composition are promising for the next generation of photonic and electronic devices. However, utilization of these materials in such devices is hindered by the limited compatibility of established semiconductor processing techniques. In this context, patterning of QD films formed from colloidal solutions is a critical challenge and alternative methods are currently being developed for the broader adoption of colloidal QDs in functional devices. Here, we present a solvent-free approach to patterning QD films by utilizing a shape memory polymer (SMP). The high pull-off force of the SMP below glass transition temperature (T(g)) in conjunction with the conformal contact at elevated temperatures (above T(g)) enables large-area, rate-independent, fine patterning while preserving desired properties of QDs.