Fabrication of SiN(x) Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching

The prevention of glow-to-arc transition exhibited by micro dielectric barrier discharge (MDBD), as well as its long lifetime, has generated much excitement across a variety of applications. Silicon nitride (SiN(x)) is often used as a dielectric barrier layer in DBD due to its excellent chemical ine...

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Detalles Bibliográficos
Autores principales: Li, Qiang, Liu, Jie, Dai, Yichuan, Xiang, Wushu, Zhang, Man, Wang, Hai, Wen, Li
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190089/
https://www.ncbi.nlm.nih.gov/pubmed/30404403
http://dx.doi.org/10.3390/mi7120232

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190089/
https://www.ncbi.nlm.nih.gov/pubmed/30404403
http://dx.doi.org/10.3390/mi7120232

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