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Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190196/ https://www.ncbi.nlm.nih.gov/pubmed/30400410 http://dx.doi.org/10.3390/mi8070219 |
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author | Horváth, Bence Ormos, Pál Kelemen, Lóránd |
author_facet | Horváth, Bence Ormos, Pál Kelemen, Lóránd |
author_sort | Horváth, Bence |
collection | PubMed |
description | In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam. |
format | Online Article Text |
id | pubmed-6190196 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2017 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-61901962018-11-01 Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers Horváth, Bence Ormos, Pál Kelemen, Lóránd Micromachines (Basel) Article In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam. MDPI 2017-07-13 /pmc/articles/PMC6190196/ /pubmed/30400410 http://dx.doi.org/10.3390/mi8070219 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Horváth, Bence Ormos, Pál Kelemen, Lóránd Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |
title | Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |
title_full | Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |
title_fullStr | Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |
title_full_unstemmed | Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |
title_short | Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |
title_sort | nearly aberration-free multiphoton polymerization into thick photoresist layers |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190196/ https://www.ncbi.nlm.nih.gov/pubmed/30400410 http://dx.doi.org/10.3390/mi8070219 |
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