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Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers

In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels...

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Autores principales: Horváth, Bence, Ormos, Pál, Kelemen, Lóránd
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190196/
https://www.ncbi.nlm.nih.gov/pubmed/30400410
http://dx.doi.org/10.3390/mi8070219
_version_ 1783363516904767488
author Horváth, Bence
Ormos, Pál
Kelemen, Lóránd
author_facet Horváth, Bence
Ormos, Pál
Kelemen, Lóránd
author_sort Horváth, Bence
collection PubMed
description In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam.
format Online
Article
Text
id pubmed-6190196
institution National Center for Biotechnology Information
language English
publishDate 2017
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-61901962018-11-01 Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers Horváth, Bence Ormos, Pál Kelemen, Lóránd Micromachines (Basel) Article In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam. MDPI 2017-07-13 /pmc/articles/PMC6190196/ /pubmed/30400410 http://dx.doi.org/10.3390/mi8070219 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Horváth, Bence
Ormos, Pál
Kelemen, Lóránd
Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
title Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
title_full Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
title_fullStr Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
title_full_unstemmed Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
title_short Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
title_sort nearly aberration-free multiphoton polymerization into thick photoresist layers
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6190196/
https://www.ncbi.nlm.nih.gov/pubmed/30400410
http://dx.doi.org/10.3390/mi8070219
work_keys_str_mv AT horvathbence nearlyaberrationfreemultiphotonpolymerizationintothickphotoresistlayers
AT ormospal nearlyaberrationfreemultiphotonpolymerizationintothickphotoresistlayers
AT kelemenlorand nearlyaberrationfreemultiphotonpolymerizationintothickphotoresistlayers