Effect of Al(2)O(3) Buffer Layers on the Properties of Sputtered VO(2) Thin Films

VO(2) thin films were grown on silicon substrates using Al(2)O(3) thin films as the buffer layers. Compared with direct deposition on silicon, VO(2) thin films deposited on Al(2)O(3) buffer layers experience a significant improvement in their microstructures and physical properties. By optimizing th...

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Detalles Bibliográficos
Autores principales: Zhang, Dainan, Wen, Tianlong, Xiong, Ying, Qiu, Donghong, Wen, Qiye
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Berlin Heidelberg 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6199022/
https://www.ncbi.nlm.nih.gov/pubmed/30393724
http://dx.doi.org/10.1007/s40820-017-0132-x

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6199022/
https://www.ncbi.nlm.nih.gov/pubmed/30393724
http://dx.doi.org/10.1007/s40820-017-0132-x

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