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Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films

In this work, the effect of plasma on the chemistry and morphology of coatings deposited by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition (AP-PECVD) is investigated. To do so, plasma deposited amorphous titanium dioxide (TiO(2)) thin films are compared to thin films deposited using...

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Detalles Bibliográficos
Autores principales:	Kang, Seongchan, Mauchauffé, Rodolphe, You, Yong Sung, Moon, Se Youn
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group UK 2018
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6232178/ https://www.ncbi.nlm.nih.gov/pubmed/30420716 http://dx.doi.org/10.1038/s41598-018-35154-4

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