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Structural and Fluorine Plasma Etching Behavior of Sputter-Deposition Yttrium Fluoride Film
Yttrium fluoride (YF(3)) films were grown on sapphire substrate by a radio frequency magnetron using a commercial ceramic target in a vacuum chamber. The structure, composition, and plasma etching behavior of the films were systematically investigated. The YF(3) film was deposited at a working press...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2018
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6265762/ https://www.ncbi.nlm.nih.gov/pubmed/30441787 http://dx.doi.org/10.3390/nano8110936 |