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Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements

We investigated the possibility of employing refractive index (RI) measurements for inline incoming slurry control at the point of use (POU), as an alternative to the widespread densitometry method. As such, it became necessary to determine if RI could detect smaller changes in slurry composition an...

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Autores principales: Vazquez Bengochea, Leticia, Sampurno, Yasa, Kavaljer, Marcus, Johnston, Rob, Philipossian, Ara
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266087/
https://www.ncbi.nlm.nih.gov/pubmed/30715041
http://dx.doi.org/10.3390/mi9110542
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author Vazquez Bengochea, Leticia
Sampurno, Yasa
Kavaljer, Marcus
Johnston, Rob
Philipossian, Ara
author_facet Vazquez Bengochea, Leticia
Sampurno, Yasa
Kavaljer, Marcus
Johnston, Rob
Philipossian, Ara
author_sort Vazquez Bengochea, Leticia
collection PubMed
description We investigated the possibility of employing refractive index (RI) measurements for inline incoming slurry control at the point of use (POU), as an alternative to the widespread densitometry method. As such, it became necessary to determine if RI could detect smaller changes in slurry composition and, therefore, provide a tighter control. Three industrially-relevant silica-based slurries, namely, Fujimi PL-7106, Klebosol 1501-50, and CMC W7801, were characterized using both densitometry and RI measurements. Initial solutions of the three slurries were prepared and increasingly small amounts of ultrapurified water (UPW) were added to study the change in slurry properties. Results showed that both density and RI decreased linearly with the addition of water for all three slurries, with the 1501-50 being the most sensitive to water addition. A linear correlation between the two properties was found, with R(2) values that exceeded 0.95 in all cases. Furthermore, the approximate limit of detection of both metrology tools was estimated based on the slope of the fitting line and resolution. When compared to densitometry, RI was found to be the far superior method for detecting smaller changes in water concentration.
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spelling pubmed-62660872018-12-06 Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements Vazquez Bengochea, Leticia Sampurno, Yasa Kavaljer, Marcus Johnston, Rob Philipossian, Ara Micromachines (Basel) Article We investigated the possibility of employing refractive index (RI) measurements for inline incoming slurry control at the point of use (POU), as an alternative to the widespread densitometry method. As such, it became necessary to determine if RI could detect smaller changes in slurry composition and, therefore, provide a tighter control. Three industrially-relevant silica-based slurries, namely, Fujimi PL-7106, Klebosol 1501-50, and CMC W7801, were characterized using both densitometry and RI measurements. Initial solutions of the three slurries were prepared and increasingly small amounts of ultrapurified water (UPW) were added to study the change in slurry properties. Results showed that both density and RI decreased linearly with the addition of water for all three slurries, with the 1501-50 being the most sensitive to water addition. A linear correlation between the two properties was found, with R(2) values that exceeded 0.95 in all cases. Furthermore, the approximate limit of detection of both metrology tools was estimated based on the slope of the fitting line and resolution. When compared to densitometry, RI was found to be the far superior method for detecting smaller changes in water concentration. MDPI 2018-10-24 /pmc/articles/PMC6266087/ /pubmed/30715041 http://dx.doi.org/10.3390/mi9110542 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Vazquez Bengochea, Leticia
Sampurno, Yasa
Kavaljer, Marcus
Johnston, Rob
Philipossian, Ara
Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
title Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
title_full Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
title_fullStr Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
title_full_unstemmed Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
title_short Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
title_sort characterization of cmp slurries using densitometry and refractive index measurements
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266087/
https://www.ncbi.nlm.nih.gov/pubmed/30715041
http://dx.doi.org/10.3390/mi9110542
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