Effects of Residual Stress Distribution on Interfacial Adhesion of Magnetron Sputtered AlN and AlN/Al Nanostructured Coatings on a (100) Silicon Substrate

The present study investigated the influence of nanoscale residual stress depth gradients on the nano-mechanical behavior and adhesion energy of aluminium nitride (AlN) and Al/AlN sputtered thin films on a (100) silicon substrate. By using a focused ion beam (FIB) incremental ring-core method, the r...

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Detalles Bibliográficos
Autores principales: Ali, Rashid, Renzelli, Marco, Khan, M. Imran, Sebastiani, Marco, Bemporad, Edoardo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266410/
https://www.ncbi.nlm.nih.gov/pubmed/30388839
http://dx.doi.org/10.3390/nano8110896

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266410/
https://www.ncbi.nlm.nih.gov/pubmed/30388839
http://dx.doi.org/10.3390/nano8110896

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