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High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm C...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2018
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266664/ https://www.ncbi.nlm.nih.gov/pubmed/30405006 http://dx.doi.org/10.3390/mi9110579 |
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author | Riverola, Martín Torres, Francesc Uranga, Arantxa Barniol, Núria |
author_facet | Riverola, Martín Torres, Francesc Uranga, Arantxa Barniol, Núria |
author_sort | Riverola, Martín |
collection | PubMed |
description | In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm CMOS technology. Three different contact materials are studied to discriminate which is the most adequate as a mechanical relay. The robustness of the relay is proved, and its main characteristics as a relay for the three different contact interfaces are provided. The seesaw relay is capable of a double hysteretic switching cycle, providing compactness for mechanical logic processing. The low contact resistance achieved with the TiN/W mechanical contact with high cycling life time is competitive in comparison with the state-of-the art. |
format | Online Article Text |
id | pubmed-6266664 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2018 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-62666642018-12-06 High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer Riverola, Martín Torres, Francesc Uranga, Arantxa Barniol, Núria Micromachines (Basel) Article In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm CMOS technology. Three different contact materials are studied to discriminate which is the most adequate as a mechanical relay. The robustness of the relay is proved, and its main characteristics as a relay for the three different contact interfaces are provided. The seesaw relay is capable of a double hysteretic switching cycle, providing compactness for mechanical logic processing. The low contact resistance achieved with the TiN/W mechanical contact with high cycling life time is competitive in comparison with the state-of-the art. MDPI 2018-11-07 /pmc/articles/PMC6266664/ /pubmed/30405006 http://dx.doi.org/10.3390/mi9110579 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Riverola, Martín Torres, Francesc Uranga, Arantxa Barniol, Núria High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer |
title | High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer |
title_full | High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer |
title_fullStr | High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer |
title_full_unstemmed | High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer |
title_short | High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer |
title_sort | high performance seesaw torsional cmos-mems relay using tungsten via layer |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266664/ https://www.ncbi.nlm.nih.gov/pubmed/30405006 http://dx.doi.org/10.3390/mi9110579 |
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