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High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer

In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm C...

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Detalles Bibliográficos
Autores principales: Riverola, Martín, Torres, Francesc, Uranga, Arantxa, Barniol, Núria
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266664/
https://www.ncbi.nlm.nih.gov/pubmed/30405006
http://dx.doi.org/10.3390/mi9110579
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author Riverola, Martín
Torres, Francesc
Uranga, Arantxa
Barniol, Núria
author_facet Riverola, Martín
Torres, Francesc
Uranga, Arantxa
Barniol, Núria
author_sort Riverola, Martín
collection PubMed
description In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm CMOS technology. Three different contact materials are studied to discriminate which is the most adequate as a mechanical relay. The robustness of the relay is proved, and its main characteristics as a relay for the three different contact interfaces are provided. The seesaw relay is capable of a double hysteretic switching cycle, providing compactness for mechanical logic processing. The low contact resistance achieved with the TiN/W mechanical contact with high cycling life time is competitive in comparison with the state-of-the art.
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spelling pubmed-62666642018-12-06 High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer Riverola, Martín Torres, Francesc Uranga, Arantxa Barniol, Núria Micromachines (Basel) Article In this paper, a seesaw torsional relay monolithically integrated in a standard 0.35 μm complementary metal oxide semiconductor (CMOS) technology is presented. The seesaw relay is fabricated using the Back-End-Of-Line (BEOL) layers available, specifically using the tungsten VIA3 layer of a 0.35 μm CMOS technology. Three different contact materials are studied to discriminate which is the most adequate as a mechanical relay. The robustness of the relay is proved, and its main characteristics as a relay for the three different contact interfaces are provided. The seesaw relay is capable of a double hysteretic switching cycle, providing compactness for mechanical logic processing. The low contact resistance achieved with the TiN/W mechanical contact with high cycling life time is competitive in comparison with the state-of-the art. MDPI 2018-11-07 /pmc/articles/PMC6266664/ /pubmed/30405006 http://dx.doi.org/10.3390/mi9110579 Text en © 2018 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Riverola, Martín
Torres, Francesc
Uranga, Arantxa
Barniol, Núria
High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
title High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
title_full High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
title_fullStr High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
title_full_unstemmed High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
title_short High Performance Seesaw Torsional CMOS-MEMS Relay Using Tungsten VIA Layer
title_sort high performance seesaw torsional cmos-mems relay using tungsten via layer
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6266664/
https://www.ncbi.nlm.nih.gov/pubmed/30405006
http://dx.doi.org/10.3390/mi9110579
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