Gas Sensing Properties of In(2)O(3) Nano-Films Obtained by Low Temperature Pulsed Electron Deposition Technique on Alumina Substrates

Nanostructured Indium(III) oxide (In(2)O(3)) films deposited by low temperature pulsed electron deposition (LPED) technique on customized alumina printed circuit boards have been manufactured and characterized as gas sensing devices. Their electrical properties have monitored directly during deposit...

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Detalles Bibliográficos
Autores principales: Addabbo, Tommaso, Bruzzi, Mara, Fort, Ada, Mugnaini, Marco, Vignoli, Valerio
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6308448/
https://www.ncbi.nlm.nih.gov/pubmed/30551626
http://dx.doi.org/10.3390/s18124410
Descripción
Sumario:Nanostructured Indium(III) oxide (In(2)O(3)) films deposited by low temperature pulsed electron deposition (LPED) technique on customized alumina printed circuit boards have been manufactured and characterized as gas sensing devices. Their electrical properties have monitored directly during deposition to optimize their sensing performance. Experimental results with oxidizing (NO(2)) as well as reducing (CO) gases in both air and inert gas carriers are discussed and modeled.

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