Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review

Semiconductor device dimensions have been decreasing steadily over the past several decades, generating the need to overcome fundamental limitations of both the materials they are made of and the fabrication techniques used to build them. Modern metal gates are no longer a simple polysilicon layer,...

Descripción completa

Detalles Bibliográficos
Autores principales: Klemenschits, Xaver, Selberherr, Siegfried, Filipovic, Lado
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2018
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6316497/
https://www.ncbi.nlm.nih.gov/pubmed/30501054
http://dx.doi.org/10.3390/mi9120631

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6316497/
https://www.ncbi.nlm.nih.gov/pubmed/30501054
http://dx.doi.org/10.3390/mi9120631

Ejemplares similares