Cargando…
Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review
Semiconductor device dimensions have been decreasing steadily over the past several decades, generating the need to overcome fundamental limitations of both the materials they are made of and the fabrication techniques used to build them. Modern metal gates are no longer a simple polysilicon layer,...
| Autores principales: | , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2018
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6316497/ https://www.ncbi.nlm.nih.gov/pubmed/30501054 http://dx.doi.org/10.3390/mi9120631 |