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Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride

Here we report on the metal assisted chemical etching method of silicon nanowires (SiNWs) manufacturing, where the commonly used hydrofluoric acid (HF) has been successfully replaced with ammonium fluoride (NH(4)F). The mechanism of the etching process and the effect of the pH values of H(2)O(2): NH...

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Detalles Bibliográficos
Autores principales:	Gonchar, Kirill A., Kitaeva, Veronika Y., Zharik, George A., Eliseev, Andrei A., Osminkina, Liubov A.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Frontiers Media S.A. 2019
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6328714/ https://www.ncbi.nlm.nih.gov/pubmed/30662894 http://dx.doi.org/10.3389/fchem.2018.00653

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