Surface relief hologram formed by selective SiO(2) deposition on soda-lime silicate glass

We propose the fabrication of surface relief holograms via selective SiO(2) deposition on soda-lime silicate glass substrates. Initially, the original hologram was recorded on an azobenzene photosensitive polymer film coated on the soda-lime silicate glass by irradiation with a conventional continuous wave Ar(+) laser with a wavelength of 514.5 nm. The hologram was transferred to the soda-lime silicate glass surface via a corona discharge treatment as an index modulation hologram, which was created by partial substitution of protons for sodium ions during the corona discharge treatment in air. After the corona discharge treatment, the polymer film was removed from the substrate. The diffraction efficiency of the index hologram on the soda-lime silicate glass was estimated to be 5.8 × 10(−2)% at a wavelength of 532 nm. Finally, the glass substrate was subjected to corona discharge treatment in air with vaporized cyclic siloxane. A surface relief hologram with the diffraction efficiency of 2.3% was successfully fabricated on the soda-lime silicate glass.