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Determination of the vapour pressure curves and vaporization enthalpies of hafnium alkoxides using thermogravimetric analysis

In order to identify a volatile metallo-organic precursor for the deposition of hafnium oxide (HfO(2)) films for atomic layer deposition (ALD) applications, the evaporative properties of hafnium alkoxides (hafnium isopropoxide, hafnium n-propoxide and hafnium n-butoxide) were investigated using ther...

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Detalles Bibliográficos
Autores principales: Wang, Changhong, Yang, Shenghai, Chen, Yongming
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6366183/
https://www.ncbi.nlm.nih.gov/pubmed/30800369
http://dx.doi.org/10.1098/rsos.181193

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