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Determination of the vapour pressure curves and vaporization enthalpies of hafnium alkoxides using thermogravimetric analysis
In order to identify a volatile metallo-organic precursor for the deposition of hafnium oxide (HfO(2)) films for atomic layer deposition (ALD) applications, the evaporative properties of hafnium alkoxides (hafnium isopropoxide, hafnium n-propoxide and hafnium n-butoxide) were investigated using ther...
Autores principales: | Wang, Changhong, Yang, Shenghai, Chen, Yongming |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6366183/ https://www.ncbi.nlm.nih.gov/pubmed/30800369 http://dx.doi.org/10.1098/rsos.181193 |
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