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Wavelength-scale ptychographic coherent diffractive imaging using a high-order harmonic source

Ptychography enables coherent diffractive imaging (CDI) of extended samples by raster scanning across the illuminating XUV/X-ray beam, thereby generalizing the unique advantages of CDI techniques. Table-top realizations of this method are urgently needed for many applications in sciences and industr...

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Detalles Bibliográficos
Autores principales: Tadesse, Getnet K., Eschen, Wilhelm, Klas, Robert, Tschernajew, Maxim, Tuitje, Frederik, Steinert, Michael, Zilk, Matthias, Schuster, Vittoria, Zürch, Michael, Pertsch, Thomas, Spielmann, Christian, Limpert, Jens, Rothhardt, Jan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6370773/
https://www.ncbi.nlm.nih.gov/pubmed/30742029
http://dx.doi.org/10.1038/s41598-019-38501-1
Descripción
Sumario:Ptychography enables coherent diffractive imaging (CDI) of extended samples by raster scanning across the illuminating XUV/X-ray beam, thereby generalizing the unique advantages of CDI techniques. Table-top realizations of this method are urgently needed for many applications in sciences and industry. Previously, it was only possible to image features much larger than the illuminating wavelength with table-top ptychography although knife-edge tests suggested sub-wavelength resolution. However, most real-world imaging applications require resolving of the smallest and closely-spaced features of a sample in an extended field of view. In this work, resolving features as small as 2.5 λ (45 nm) using a table-top ptychography setup is demonstrated by employing a high-order harmonic XUV source with record-high photon flux. For the first time, a Rayleigh-type criterion is used as a direct and unambiguous resolution metric for high-resolution table-top setup. This reliably qualifies this imaging system for real-world applications e.g. in biological sciences, material sciences, imaging integrated circuits and semiconductor mask inspection.