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Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2)
Charge carriers in semiconducting transition metal dichalcogenides possess a valley degree of freedom that allows for optoelectronic applications based on the momentum of excitons. At elevated temperatures, scattering by phonons limits valley polarization, making a detailed knowledge about strength...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6379367/ https://www.ncbi.nlm.nih.gov/pubmed/30778074 http://dx.doi.org/10.1038/s41467-019-08764-3 |
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author | Miller, Bastian Lindlau, Jessica Bommert, Max Neumann, Andre Yamaguchi, Hisato Holleitner, Alexander Högele, Alexander Wurstbauer, Ursula |
author_facet | Miller, Bastian Lindlau, Jessica Bommert, Max Neumann, Andre Yamaguchi, Hisato Holleitner, Alexander Högele, Alexander Wurstbauer, Ursula |
author_sort | Miller, Bastian |
collection | PubMed |
description | Charge carriers in semiconducting transition metal dichalcogenides possess a valley degree of freedom that allows for optoelectronic applications based on the momentum of excitons. At elevated temperatures, scattering by phonons limits valley polarization, making a detailed knowledge about strength and nature of the interaction of excitons with phonons essential. In this work, we directly access exciton-phonon coupling in charge tunable single layer MoS(2) devices by polarization resolved Raman spectroscopy. We observe a strong defect mediated coupling between the long-range oscillating electric field induced by the longitudinal optical phonon in the dipolar medium and the exciton. This so-called Fröhlich exciton phonon interaction is suppressed by doping. The suppression correlates with a distinct increase of the degree of valley polarization up to 20% even at elevated temperatures of 220 K. Our result demonstrates a promising strategy to increase the degree of valley polarization towards room temperature valleytronic applications. |
format | Online Article Text |
id | pubmed-6379367 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-63793672019-02-21 Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) Miller, Bastian Lindlau, Jessica Bommert, Max Neumann, Andre Yamaguchi, Hisato Holleitner, Alexander Högele, Alexander Wurstbauer, Ursula Nat Commun Article Charge carriers in semiconducting transition metal dichalcogenides possess a valley degree of freedom that allows for optoelectronic applications based on the momentum of excitons. At elevated temperatures, scattering by phonons limits valley polarization, making a detailed knowledge about strength and nature of the interaction of excitons with phonons essential. In this work, we directly access exciton-phonon coupling in charge tunable single layer MoS(2) devices by polarization resolved Raman spectroscopy. We observe a strong defect mediated coupling between the long-range oscillating electric field induced by the longitudinal optical phonon in the dipolar medium and the exciton. This so-called Fröhlich exciton phonon interaction is suppressed by doping. The suppression correlates with a distinct increase of the degree of valley polarization up to 20% even at elevated temperatures of 220 K. Our result demonstrates a promising strategy to increase the degree of valley polarization towards room temperature valleytronic applications. Nature Publishing Group UK 2019-02-18 /pmc/articles/PMC6379367/ /pubmed/30778074 http://dx.doi.org/10.1038/s41467-019-08764-3 Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Miller, Bastian Lindlau, Jessica Bommert, Max Neumann, Andre Yamaguchi, Hisato Holleitner, Alexander Högele, Alexander Wurstbauer, Ursula Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) |
title | Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) |
title_full | Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) |
title_fullStr | Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) |
title_full_unstemmed | Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) |
title_short | Tuning the Fröhlich exciton-phonon scattering in monolayer MoS(2) |
title_sort | tuning the fröhlich exciton-phonon scattering in monolayer mos(2) |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6379367/ https://www.ncbi.nlm.nih.gov/pubmed/30778074 http://dx.doi.org/10.1038/s41467-019-08764-3 |
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