Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering

Direct-current magnetron sputtering (DCMS) was applied to prepare vanadium (V) films on Si substrate. The influence of substrate temperature (T(s)) and target–substrate distance (D(t–s)) on phase structure and surface morphology of V films were investigated by X-ray diffraction (XRD), scanning elect...

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Detalles Bibliográficos
Autores principales: Zhang, Song, Wang, Tingting, Zhang, Ziyu, Li, Jun, Tu, Rong, Shen, Qiang, Wang, Chuanbin, Luo, Guoqiang, Zhang, Lianmeng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6384545/
https://www.ncbi.nlm.nih.gov/pubmed/30704091
http://dx.doi.org/10.3390/ma12030425

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6384545/
https://www.ncbi.nlm.nih.gov/pubmed/30704091
http://dx.doi.org/10.3390/ma12030425

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