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Choosing a substrate for the ion irradiation of two-dimensional materials
This study is dedicated to the common problem of how to choose a suitable substrate for ion irradiation of two-dimensional materials in order to achieve specific roles of certain defect formation mechanisms. The estimations include Monte Carlo simulations for He, Ar, Xe, C, N and Si ions, performed...
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Formato: | Online Artículo Texto |
Lenguaje: | English |
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Beilstein-Institut
2019
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6404516/ https://www.ncbi.nlm.nih.gov/pubmed/30873325 http://dx.doi.org/10.3762/bjnano.10.54 |
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author | Kolesov, Egor A |
author_facet | Kolesov, Egor A |
author_sort | Kolesov, Egor A |
collection | PubMed |
description | This study is dedicated to the common problem of how to choose a suitable substrate for ion irradiation of two-dimensional materials in order to achieve specific roles of certain defect formation mechanisms. The estimations include Monte Carlo simulations for He, Ar, Xe, C, N and Si ions, performed in the incident ion energy range from 100 eV to 250 MeV. Cu, SiO(2), SiC and Al(2)O(3) substrates were analyzed. The considered substrate-related defect formation mechanisms are sputtering, recoil atoms reaching the interface with a non-zero energy, and generation of hot electrons in close proximity of the interface. Additionally, the implantation of sputtered substrate atoms into the 2D material lattice is analyzed. This work is useful both for fundamental studies of irradiation of two-dimensional materials and as a practical guide on choosing the conditions necessary to obtain certain parameters of irradiated materials. |
format | Online Article Text |
id | pubmed-6404516 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Beilstein-Institut |
record_format | MEDLINE/PubMed |
spelling | pubmed-64045162019-03-14 Choosing a substrate for the ion irradiation of two-dimensional materials Kolesov, Egor A Beilstein J Nanotechnol Full Research Paper This study is dedicated to the common problem of how to choose a suitable substrate for ion irradiation of two-dimensional materials in order to achieve specific roles of certain defect formation mechanisms. The estimations include Monte Carlo simulations for He, Ar, Xe, C, N and Si ions, performed in the incident ion energy range from 100 eV to 250 MeV. Cu, SiO(2), SiC and Al(2)O(3) substrates were analyzed. The considered substrate-related defect formation mechanisms are sputtering, recoil atoms reaching the interface with a non-zero energy, and generation of hot electrons in close proximity of the interface. Additionally, the implantation of sputtered substrate atoms into the 2D material lattice is analyzed. This work is useful both for fundamental studies of irradiation of two-dimensional materials and as a practical guide on choosing the conditions necessary to obtain certain parameters of irradiated materials. Beilstein-Institut 2019-02-22 /pmc/articles/PMC6404516/ /pubmed/30873325 http://dx.doi.org/10.3762/bjnano.10.54 Text en Copyright © 2019, Kolesov https://creativecommons.org/licenses/by/4.0https://www.beilstein-journals.org/bjnano/termsThis is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0). Please note that the reuse, redistribution and reproduction in particular requires that the authors and source are credited. The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms) |
spellingShingle | Full Research Paper Kolesov, Egor A Choosing a substrate for the ion irradiation of two-dimensional materials |
title | Choosing a substrate for the ion irradiation of two-dimensional materials |
title_full | Choosing a substrate for the ion irradiation of two-dimensional materials |
title_fullStr | Choosing a substrate for the ion irradiation of two-dimensional materials |
title_full_unstemmed | Choosing a substrate for the ion irradiation of two-dimensional materials |
title_short | Choosing a substrate for the ion irradiation of two-dimensional materials |
title_sort | choosing a substrate for the ion irradiation of two-dimensional materials |
topic | Full Research Paper |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6404516/ https://www.ncbi.nlm.nih.gov/pubmed/30873325 http://dx.doi.org/10.3762/bjnano.10.54 |
work_keys_str_mv | AT kolesovegora choosingasubstratefortheionirradiationoftwodimensionalmaterials |