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Growth of Plasma-Treated Corn Seeds under Realistic Conditions

In this study, the effect of the plasma treatment on corn seeds is investigated. Corn seeds were treated uniformly without burning or blackening by three kinds of plasma apparatus: RF plasma in vacuum, microwave-driven atmospheric-pressure plasma, DBD atmospheric-pressure plasma, and two other treat...

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Autores principales: Ahn, Chisung, Gill, John, Ruzic, David N.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6416314/
https://www.ncbi.nlm.nih.gov/pubmed/30867484
http://dx.doi.org/10.1038/s41598-019-40700-9
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author Ahn, Chisung
Gill, John
Ruzic, David N.
author_facet Ahn, Chisung
Gill, John
Ruzic, David N.
author_sort Ahn, Chisung
collection PubMed
description In this study, the effect of the plasma treatment on corn seeds is investigated. Corn seeds were treated uniformly without burning or blackening by three kinds of plasma apparatus: RF plasma in vacuum, microwave-driven atmospheric-pressure plasma, DBD atmospheric-pressure plasma, and two other treatments: vacuum exposure only, and using plasma-activated water in the seed coating process, to investigate growth rate changes under realistic conditions. Each treatment was performed on a total of 1512 corn seeds. Seeds from each experimental condition were treated with the recommended rate of Poncho/VOTiVO with Acceleron, a commercial biological seed treatment that helps to protect the seeds from fungus, insects, and nematodes after planting. The 1512 seeds were divided evenly into three replications with 84 seeds planted for each replication at six unique locations across central Illinois. The results for germination, growth, and product yield over the 2017 growing season is presented. Overall no statistically significant difference in the yield of corn harvested was found between the control and any of the five treatments. This is likely due to the already near-100% germination rate of the corn hybrid used in the study and the use of the Poncho/VOTiVO protective coating on every sample.
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spelling pubmed-64163142019-03-15 Growth of Plasma-Treated Corn Seeds under Realistic Conditions Ahn, Chisung Gill, John Ruzic, David N. Sci Rep Article In this study, the effect of the plasma treatment on corn seeds is investigated. Corn seeds were treated uniformly without burning or blackening by three kinds of plasma apparatus: RF plasma in vacuum, microwave-driven atmospheric-pressure plasma, DBD atmospheric-pressure plasma, and two other treatments: vacuum exposure only, and using plasma-activated water in the seed coating process, to investigate growth rate changes under realistic conditions. Each treatment was performed on a total of 1512 corn seeds. Seeds from each experimental condition were treated with the recommended rate of Poncho/VOTiVO with Acceleron, a commercial biological seed treatment that helps to protect the seeds from fungus, insects, and nematodes after planting. The 1512 seeds were divided evenly into three replications with 84 seeds planted for each replication at six unique locations across central Illinois. The results for germination, growth, and product yield over the 2017 growing season is presented. Overall no statistically significant difference in the yield of corn harvested was found between the control and any of the five treatments. This is likely due to the already near-100% germination rate of the corn hybrid used in the study and the use of the Poncho/VOTiVO protective coating on every sample. Nature Publishing Group UK 2019-03-13 /pmc/articles/PMC6416314/ /pubmed/30867484 http://dx.doi.org/10.1038/s41598-019-40700-9 Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Ahn, Chisung
Gill, John
Ruzic, David N.
Growth of Plasma-Treated Corn Seeds under Realistic Conditions
title Growth of Plasma-Treated Corn Seeds under Realistic Conditions
title_full Growth of Plasma-Treated Corn Seeds under Realistic Conditions
title_fullStr Growth of Plasma-Treated Corn Seeds under Realistic Conditions
title_full_unstemmed Growth of Plasma-Treated Corn Seeds under Realistic Conditions
title_short Growth of Plasma-Treated Corn Seeds under Realistic Conditions
title_sort growth of plasma-treated corn seeds under realistic conditions
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6416314/
https://www.ncbi.nlm.nih.gov/pubmed/30867484
http://dx.doi.org/10.1038/s41598-019-40700-9
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