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Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers
Vertically aligned carbon nanotubes (VACNTs) were synthesized on different oxide buffer layers using chemical vapor deposition (CVD). The growth of the VACNTs was mainly determined by three factors: the Ostwald ripening of catalyst nanoparticles, subsurface diffusion of Fe, and their activation ener...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6428882/ https://www.ncbi.nlm.nih.gov/pubmed/30900108 http://dx.doi.org/10.1186/s11671-019-2938-6 |
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author | Li, Haohao Yuan, Guangjie Shan, Bo Zhang, Xiaoxin Ma, Hongping Tian, Yingzhong Lu, Hongliang Liu, Johan |
author_facet | Li, Haohao Yuan, Guangjie Shan, Bo Zhang, Xiaoxin Ma, Hongping Tian, Yingzhong Lu, Hongliang Liu, Johan |
author_sort | Li, Haohao |
collection | PubMed |
description | Vertically aligned carbon nanotubes (VACNTs) were synthesized on different oxide buffer layers using chemical vapor deposition (CVD). The growth of the VACNTs was mainly determined by three factors: the Ostwald ripening of catalyst nanoparticles, subsurface diffusion of Fe, and their activation energy for nucleation and initial growth. The surface roughness of buffer layers largely influenced the diameter and density of catalyst nanoparticles after annealing, which apparently affected the lifetime of the nanoparticles and the thickness of the prepared VACNTs. In addition, the growth of the VACNTs was also affected by the deposition temperature, and the lifetime of the catalyst nanoparticles apparently decreased when the deposition temperature was greater than 600 °C due to their serious Ostwald ripening. Furthermore, in addition to the number of catalyst nanoparticles, the density of the VACNTs was also largely dependent on their activation energy for nucleation and initial growth. |
format | Online Article Text |
id | pubmed-6428882 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-64288822019-04-05 Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers Li, Haohao Yuan, Guangjie Shan, Bo Zhang, Xiaoxin Ma, Hongping Tian, Yingzhong Lu, Hongliang Liu, Johan Nanoscale Res Lett Nano Express Vertically aligned carbon nanotubes (VACNTs) were synthesized on different oxide buffer layers using chemical vapor deposition (CVD). The growth of the VACNTs was mainly determined by three factors: the Ostwald ripening of catalyst nanoparticles, subsurface diffusion of Fe, and their activation energy for nucleation and initial growth. The surface roughness of buffer layers largely influenced the diameter and density of catalyst nanoparticles after annealing, which apparently affected the lifetime of the nanoparticles and the thickness of the prepared VACNTs. In addition, the growth of the VACNTs was also affected by the deposition temperature, and the lifetime of the catalyst nanoparticles apparently decreased when the deposition temperature was greater than 600 °C due to their serious Ostwald ripening. Furthermore, in addition to the number of catalyst nanoparticles, the density of the VACNTs was also largely dependent on their activation energy for nucleation and initial growth. Springer US 2019-03-21 /pmc/articles/PMC6428882/ /pubmed/30900108 http://dx.doi.org/10.1186/s11671-019-2938-6 Text en © The Author(s). 2019 Open Access This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. |
spellingShingle | Nano Express Li, Haohao Yuan, Guangjie Shan, Bo Zhang, Xiaoxin Ma, Hongping Tian, Yingzhong Lu, Hongliang Liu, Johan Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers |
title | Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers |
title_full | Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers |
title_fullStr | Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers |
title_full_unstemmed | Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers |
title_short | Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers |
title_sort | chemical vapor deposition of vertically aligned carbon nanotube arrays: critical effects of oxide buffer layers |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6428882/ https://www.ncbi.nlm.nih.gov/pubmed/30900108 http://dx.doi.org/10.1186/s11671-019-2938-6 |
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