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Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study

A robust synthesis methodology for crystallizing nanoporous single-layer graphene hosting a high density of size-selective nanopores is urgently needed to realize the true potential of two-dimensional membranes for gas separation. Currently, there are no controllable etching techniques for single-la...

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Autores principales: Dutta, Soumajit, Vahdat, Mohammad Tohidi, Rezaei, Mojtaba, Agrawal, Kumar Varoon
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6435714/
https://www.ncbi.nlm.nih.gov/pubmed/30914744
http://dx.doi.org/10.1038/s41598-019-41645-9
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author Dutta, Soumajit
Vahdat, Mohammad Tohidi
Rezaei, Mojtaba
Agrawal, Kumar Varoon
author_facet Dutta, Soumajit
Vahdat, Mohammad Tohidi
Rezaei, Mojtaba
Agrawal, Kumar Varoon
author_sort Dutta, Soumajit
collection PubMed
description A robust synthesis methodology for crystallizing nanoporous single-layer graphene hosting a high density of size-selective nanopores is urgently needed to realize the true potential of two-dimensional membranes for gas separation. Currently, there are no controllable etching techniques for single-layer graphene that are self-limiting, and that can generate size-selective nanopores at a high pore-density. In this work, we simulate a unique chemical vapor deposition based crystallization of graphene on Cu(111), in the presence of an etchant, to generate a high density (>10(13) cm(−2)) of sub-nanometer-sized, elongated nanopores in graphene. An equilibrium between the growth rate and the etching rate is obtained, and beyond a critical time, the total number of the carbon atoms and the edge carbon atoms do not change. Using an optimal first-order etching chemistry, a log-mean pore-size of 5.0 ± 1.7 (number of missing carbon atoms), and a pore-density of 3 × 10(13) cm(−2) was achieved. A high throughput calculation route for estimating gas selectivity from ensembles of thousands of nanopores was developed. The optimized result yielded H(2)/CO(2), H(2)/N(2) and H(2)/CH(4) selectivities larger than 200, attributing to elongated pores generated by the competitive etching and growth. The approach of competitive etching during the crystal growth is quite generic and can be applied to a number of two-dimensional materials.
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spelling pubmed-64357142019-04-03 Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study Dutta, Soumajit Vahdat, Mohammad Tohidi Rezaei, Mojtaba Agrawal, Kumar Varoon Sci Rep Article A robust synthesis methodology for crystallizing nanoporous single-layer graphene hosting a high density of size-selective nanopores is urgently needed to realize the true potential of two-dimensional membranes for gas separation. Currently, there are no controllable etching techniques for single-layer graphene that are self-limiting, and that can generate size-selective nanopores at a high pore-density. In this work, we simulate a unique chemical vapor deposition based crystallization of graphene on Cu(111), in the presence of an etchant, to generate a high density (>10(13) cm(−2)) of sub-nanometer-sized, elongated nanopores in graphene. An equilibrium between the growth rate and the etching rate is obtained, and beyond a critical time, the total number of the carbon atoms and the edge carbon atoms do not change. Using an optimal first-order etching chemistry, a log-mean pore-size of 5.0 ± 1.7 (number of missing carbon atoms), and a pore-density of 3 × 10(13) cm(−2) was achieved. A high throughput calculation route for estimating gas selectivity from ensembles of thousands of nanopores was developed. The optimized result yielded H(2)/CO(2), H(2)/N(2) and H(2)/CH(4) selectivities larger than 200, attributing to elongated pores generated by the competitive etching and growth. The approach of competitive etching during the crystal growth is quite generic and can be applied to a number of two-dimensional materials. Nature Publishing Group UK 2019-03-26 /pmc/articles/PMC6435714/ /pubmed/30914744 http://dx.doi.org/10.1038/s41598-019-41645-9 Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Dutta, Soumajit
Vahdat, Mohammad Tohidi
Rezaei, Mojtaba
Agrawal, Kumar Varoon
Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
title Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
title_full Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
title_fullStr Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
title_full_unstemmed Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
title_short Crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
title_sort crystallization of gas-selective nanoporous graphene by competitive etching and growth: a modeling study
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6435714/
https://www.ncbi.nlm.nih.gov/pubmed/30914744
http://dx.doi.org/10.1038/s41598-019-41645-9
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