Cargando…
Off-stoichiometry improves the photostructuring of thiol–enes through diffusion-induced monomer depletion
Thiol–enes are a group of alternating copolymers with highly ordered networks and are used in a wide range of applications. Here, “click” chemistry photostructuring in off-stoichiometric thiol–enes is shown to induce microscale polymeric compositional gradients due to species diffusion between non-i...
Autores principales: | , , , , , , , |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6444721/ https://www.ncbi.nlm.nih.gov/pubmed/31057810 http://dx.doi.org/10.1038/micronano.2015.43 |
Sumario: | Thiol–enes are a group of alternating copolymers with highly ordered networks and are used in a wide range of applications. Here, “click” chemistry photostructuring in off-stoichiometric thiol–enes is shown to induce microscale polymeric compositional gradients due to species diffusion between non-illuminated and illuminated regions, creating two narrow zones with distinct compositions on either side of the photomask feature boundary: a densely cross-linked zone in the illuminated region and a zone with an unpolymerized highly off-stoichiometric monomer composition in the non-illuminated region. Using confocal Raman microscopy, it is here explained how species diffusion causes such intricate compositional gradients in the polymer and how off-stoichiometry results in improved image transfer accuracy in thiol–ene photostructuring. Furthermore, increasing the functional group off-stoichiometry and decreasing the photomask feature size is shown to amplify the induced gradients, which potentially leads to a new methodology for microstructuring. |
---|