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Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer
We fabricated the stacked bilayer molybdenum disulfide (MoS(2)) by using reduced graphene oxide (rGO) as a spacer for increasing the optoelectronic properties of MoS(2). The rGO can decrease the interlayer coupling between the stacked bilayer MoS(2) and retain the direct band gap property of MoS(2)....
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6459906/ https://www.ncbi.nlm.nih.gov/pubmed/30976032 http://dx.doi.org/10.1038/s41598-019-42446-w |
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author | Oh, Hye Min Kim, Hyojung Kim, Hyun Jeong, Mun Seok |
author_facet | Oh, Hye Min Kim, Hyojung Kim, Hyun Jeong, Mun Seok |
author_sort | Oh, Hye Min |
collection | PubMed |
description | We fabricated the stacked bilayer molybdenum disulfide (MoS(2)) by using reduced graphene oxide (rGO) as a spacer for increasing the optoelectronic properties of MoS(2). The rGO can decrease the interlayer coupling between the stacked bilayer MoS(2) and retain the direct band gap property of MoS(2). We observed a twofold enhancement of the photoluminescence intensity of the stacked MoS(2) bilayer. In the Raman scattering, we observed that the E(1)(2g) and A(1g) modes of the stacked bilayer MoS(2) with rGO were further shifted compared to monolayer MoS(2), which is due to the van der Waals (vdW) interaction and the strain effect between the MoS(2) and rGO layers. The findings of this study will expand the applicability of monolayer MoS(2) for high-performance optoelectronic devices by enhancing the optical properties using a vdW spacer. |
format | Online Article Text |
id | pubmed-6459906 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Nature Publishing Group UK |
record_format | MEDLINE/PubMed |
spelling | pubmed-64599062019-04-16 Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer Oh, Hye Min Kim, Hyojung Kim, Hyun Jeong, Mun Seok Sci Rep Article We fabricated the stacked bilayer molybdenum disulfide (MoS(2)) by using reduced graphene oxide (rGO) as a spacer for increasing the optoelectronic properties of MoS(2). The rGO can decrease the interlayer coupling between the stacked bilayer MoS(2) and retain the direct band gap property of MoS(2). We observed a twofold enhancement of the photoluminescence intensity of the stacked MoS(2) bilayer. In the Raman scattering, we observed that the E(1)(2g) and A(1g) modes of the stacked bilayer MoS(2) with rGO were further shifted compared to monolayer MoS(2), which is due to the van der Waals (vdW) interaction and the strain effect between the MoS(2) and rGO layers. The findings of this study will expand the applicability of monolayer MoS(2) for high-performance optoelectronic devices by enhancing the optical properties using a vdW spacer. Nature Publishing Group UK 2019-04-11 /pmc/articles/PMC6459906/ /pubmed/30976032 http://dx.doi.org/10.1038/s41598-019-42446-w Text en © The Author(s) 2019 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
spellingShingle | Article Oh, Hye Min Kim, Hyojung Kim, Hyun Jeong, Mun Seok Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer |
title | Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer |
title_full | Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer |
title_fullStr | Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer |
title_full_unstemmed | Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer |
title_short | Fabrication of Stacked MoS(2) Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer |
title_sort | fabrication of stacked mos(2) bilayer with weak interlayer coupling by reduced graphene oxide spacer |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6459906/ https://www.ncbi.nlm.nih.gov/pubmed/30976032 http://dx.doi.org/10.1038/s41598-019-42446-w |
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