The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering

Many strategies have been developed for the synthesis of silicon carbide (SiC) thin films on silicon (Si) substrates by plasma-based deposition techniques, especially plasma enhanced chemical vapor deposition (PECVD) and magnetron sputtering, due to the importance of these materials for microelectro...

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Detalles Bibliográficos
Autores principales: Galvão, Nierlly, Guerino, Marciel, Campos, Tiago, Grigorov, Korneli, Fraga, Mariana, Rodrigues, Bruno, Pessoa, Rodrigo, Camus, Julien, Djouadi, Mohammed, Maciel, Homero
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6471747/
https://www.ncbi.nlm.nih.gov/pubmed/30909406
http://dx.doi.org/10.3390/mi10030202

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