Maskless Spatioselective Functionalization of Silicon Nanowires

Spatioselective functionalization of silicon nanowires was achieved without using a masking material. The designed process combines metal‐assisted chemical etching (MACE) to fabricate silicon nanowires and hydrosilylation to form molecular monolayers. After MACE, a monolayer was formed on the expose...

Descripción completa

Detalles Bibliográficos
Autores principales: Veerbeek, Janneke, Huskens, Jurriaan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2018
Materias:
Full Papers
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6473541/
https://www.ncbi.nlm.nih.gov/pubmed/31032177
http://dx.doi.org/10.1002/cnma.201800072

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6473541/
https://www.ncbi.nlm.nih.gov/pubmed/31032177
http://dx.doi.org/10.1002/cnma.201800072

Ejemplares similares