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The Modulation Effect of MoS(2) Monolayers on the Nucleation and Growth of Pd Clusters: First-Principles Study

The geometries, electronic structures, adsorption, diffusion, and nucleation behaviors of Pd(n) (n = 1–5) clusters on MoS(2) monolayers (MLs) were investigated using first principles calculations to elucidate the initial growth of metal on MoS(2). The results demonstrate that Pd clusters can chemica...

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Detalles Bibliográficos
Autores principales: Wu, Ping, Huang, Min, Yin, Naiqiang, Li, Peng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6473977/
https://www.ncbi.nlm.nih.gov/pubmed/30857215
http://dx.doi.org/10.3390/nano9030395
Descripción
Sumario:The geometries, electronic structures, adsorption, diffusion, and nucleation behaviors of Pd(n) (n = 1–5) clusters on MoS(2) monolayers (MLs) were investigated using first principles calculations to elucidate the initial growth of metal on MoS(2). The results demonstrate that Pd clusters can chemically adsorb on MoS(2) MLs forming strong Pd–S covalent bonds with significant ionic character. We investigated the initial growth mode of Pd clusters on MoS(2) monolayers and found that Pd(n) clusters tend to adopt pyramid-like structures for n = 4–5 and planar structures lying on MoS(2) substrates for n = 1–3. It can be explained by the competition between adsorbate–substrate and the intra-clusters’ interactions with the increasing coverage. Compared with pristine MoS(2) MLs, the work function was reduced from 5.01 eV upon adsorption of Pd monomer to 4.38 eV for the case of the Pd(5) clusters due to the charge transfer from Pd clusters to MoS(2) MLs. In addition, our calculations of the nucleation and diffusion behaviors of Pd clusters on MoS(2) MLs predicted that Pd is likely to agglomerate to metal nanotemplates on MoS(2) MLs during the epitaxial stacking process. These findings may provide useful guidance to extend the potential technological applications of MoS(2), including catalysts and production of metal thin films, and the fabrication of nanoelectronic devices.