Cargando…

Blue Electroluminescent Al(2)O(3)/Tm(2)O(3) Nanolaminate Films Fabricated by Atomic Layer Deposition on Silicon

Realization of a silicon-based light source is of significant importance for the future development of optoelectronics and telecommunications. Here, nanolaminate Al(2)O(3)/Tm(2)O(3) films are fabricated on silicon utilizing atomic layer deposition, and intense blue electroluminescence (EL) from Tm(3...

Descripción completa

Detalles Bibliográficos
Autores principales:	Liu, Yao, Ouyang, Zhongtao, Yang, Li, Yang, Yang, Sun, Jiaming
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2019
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6474135/ https://www.ncbi.nlm.nih.gov/pubmed/30862053 http://dx.doi.org/10.3390/nano9030413

Ejemplares similares

Enhancement of the Electroluminescence from Amorphous Er-Doped Al(2)O(3) Nanolaminate Films by Y(2)O(3) Cladding Layers Using Atomic Layer Deposition
por: Yang, Yang, et al.
Publicado: (2023)

Optical and microstructural properties of ZnO/TiO(2) nanolaminates prepared by atomic layer deposition
por: Gu, Yu-Zhu, et al.
Publicado: (2013)

Low-temperature atomic layer deposition of Al(2)O(3)/alucone nanolaminates for OLED encapsulation
por: Chen, Guixiong, et al.
Publicado: (2019)

Atomic Layer Deposition of Ultrathin La(2)O(3)/Al(2)O(3) Nanolaminates on MoS(2) with Ultraviolet Ozone Treatment
por: Fan, Jibin, et al.
Publicado: (2022)

Fracture Mechanics and Oxygen Gas Barrier Properties of Al(2)O(3)/ZnO Nanolaminates on PET Deposited by Atomic Layer Deposition
por: Chawla, Vipin, et al.
Publicado: (2019)

Atomic layer deposition of ZnO/TiO(2) nanolaminates as ultra-long life anode material for lithium-ion batteries
por: Cao, Yan-Qiang, et al.
Publicado: (2019)

Investigation of the Corrosion Behavior of Atomic Layer Deposited Al(2)O(3)/TiO(2) Nanolaminate Thin Films on Copper in 0.1 M NaCl
por: Fusco, Michael A., et al.
Publicado: (2019)

Transparent and flexible capacitors based on nanolaminate Al(2)O(3)/TiO(2)/Al(2)O(3)
por: Zhang, Guozhen, et al.
Publicado: (2015)

Red Y(2)O(3):Eu-Based Electroluminescent Device Prepared by Atomic Layer Deposition for Transparent Display Applications
por: Rosa, José, et al.
Publicado: (2021)

Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta(2)O(5)-Al(2)O(3) Films Grown on Silicon by Atomic Layer Deposition
por: Li, Junpeng, et al.
Publicado: (2019)

Strong Magneto-Optical Kerr Effects in Ni-Doped ZnO Nanolaminate Structures Obtained by Atomic Layer Deposition
por: Galluzzi, Armando, et al.
Publicado: (2023)

Effects of Rapid Thermal Annealing and Different Oxidants on the Properties of La(x)Al(y)O Nanolaminate Films Deposited by Atomic Layer Deposition
por: Fei, Chenxi, et al.
Publicado: (2017)

Radiation Tolerance and Charge Trapping Enhancement of ALD HfO(2)/Al(2)O(3) Nanolaminated Dielectrics
por: Spassov, Dencho, et al.
Publicado: (2021)

Effects of Bilayer Thickness on the Morphological, Optical, and Electrical Properties of Al(2)O(3)/ZnO Nanolaminates
por: Li, Da-Hai, et al.
Publicado: (2017)

Silicon Nanowire Heterojunction Solar Cells with an Al(2)O(3) Passivation Film Fabricated by Atomic Layer Deposition
por: Kato, Shinya, et al.
Publicado: (2019)

Al(2)O(3)/HfO(2) Nanolaminate Dielectric Boosting IGZO-Based Flexible Thin-Film Transistors
por: Shi, Qiuwei, et al.
Publicado: (2022)

Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition
por: Kalam, Kristjan, et al.
Publicado: (2022)

Silicon diffusion control in atomic-layer-deposited Al(2)O(3)/La(2)O(3)/Al(2)O(3) gate stacks using an Al(2)O(3) barrier layer
por: Wang, Xing, et al.
Publicado: (2015)

Low-temperature remote plasma enhanced atomic layer deposition of ZrO(2)/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes
por: Chen, Zheng, et al.
Publicado: (2017)

Surface Passivation of Silicon Using HfO(2) Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
por: Zhang, Xiao-Ying, et al.
Publicado: (2017)

Atomic layer deposition and properties of ZrO(2)/Fe(2)O(3) thin films
por: Kalam, Kristjan, et al.
Publicado: (2018)

Passivation mechanism of thermal atomic layer-deposited Al(2)O(3) films on silicon at different annealing temperatures
por: Zhao, Yan, et al.
Publicado: (2013)

Investigation on the passivated Si/Al(2)O(3) interface fabricated by non-vacuum spatial atomic layer deposition system
por: Lien, Shui-Yang, et al.
Publicado: (2015)

Thermo-Optical Properties of Thin-Film TiO(2)–Al(2)O(3) Bilayers Fabricated by Atomic Layer Deposition
por: Ali, Rizwan, et al.
Publicado: (2015)

Advances in Atomic Layer Deposition (ALD) Nanolaminate Synthesis of Thermoelectric Films in Porous Templates for Improved Seebeck Coefficient
por: Chen, Xin, et al.
Publicado: (2020)

Growth of nanolaminate structure of tetragonal zirconia by pulsed laser deposition
por: Balakrishnan, Govindasamy, et al.
Publicado: (2013)

Blue Electroluminescence in SRO-HFCVD Films
por: Martínez, Haydee P., et al.
Publicado: (2021)

Compact Ga(2)O(3) Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature
por: Yang, Yue, et al.
Publicado: (2022)

Pressure driven polymorphic transitions in nanocrystalline Lu(2)O(3), Tm(2)O(3) and Eu(2)O(3)
por: Bura, Neha, et al.
Publicado: (2023)

Interface Engineering of TiO(2) Photoelectrode Coatings Grown by Atomic Layer Deposition on Silicon
por: Saari, Jesse, et al.
Publicado: (2021)

Uniformity and passivation research of Al(2)O(3) film on silicon substrate prepared by plasma-enhanced atom layer deposition
por: Jia, Endong, et al.
Publicado: (2015)

Atomic layer deposition for fabrication of HfO(2)/Al(2)O(3) thin films with high laser-induced damage thresholds
por: Wei, Yaowei, et al.
Publicado: (2015)

Challenges to Optimize Charge Trapping Non-Volatile Flash Memory Cells: A Case Study of HfO(2)/Al(2)O(3) Nanolaminated Stacks
por: Spassov, Dencho, et al.
Publicado: (2023)

Dielectric Enhancement of Atomic Layer-Deposited Al(2)O(3)/ZrO(2)/Al(2)O(3) MIM Capacitors by Microwave Annealing
por: Zhu, Bao, et al.
Publicado: (2019)

Chemical Vapour Deposition Graphene–PMMA Nanolaminates for Flexible Gas Barrier
por: Baldanza, Antonio, et al.
Publicado: (2022)

Tm(3+); Yb(3+):Zn(2)TiO(4) near infrared to blue upconversion phosphors for anti-counterfeit applications
por: Dutta, Joydip, et al.
Publicado: (2023)

Electroluminescence of atoms in a graphene nanogap
por: Kim, Hyungsik, et al.
Publicado: (2022)

Degradation of Methylene Blue Dye in the Presence of Visible Light Using SiO(2)@α-Fe(2)O(3) Nanocomposites Deposited on SnS(2) Flowers
por: Balu, Sridharan, et al.
Publicado: (2018)

Electrical and optical properties of Al-doped ZnO and ZnAl(2)O(4) films prepared by atomic layer deposition
por: Hou, Qiongqiong, et al.
Publicado: (2013)

Chemically Stable Atomic-Layer-Deposited Al(2)O(3) Films for Processability
por: Broas, Mikael, et al.
Publicado: (2017)

Cannot write session to /tmp/vufind_sessions/sess_es2rg9cusav6ve8j2g0gj84pm0