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Ion beam etching redeposition for 3D multimaterial nanostructure manufacturing
A novel fabrication method based on the local sputtering of photoresist sidewalls during ion beam etching is presented. This method allows for the manufacture of three-dimensional multimaterial nanostructures at the wafer scale in only four process steps. Features of various shapes and profiles can...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2019
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6475643/ https://www.ncbi.nlm.nih.gov/pubmed/31057938 http://dx.doi.org/10.1038/s41378-019-0052-7 |