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Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems

OBJECTIVES: This study evaluated the effect of air-drying time and light-curing time on the degree of conversion (DC) of three etch-and-rinse adhesive systems: ONE-STEP (OS) and ONE-STEP plus (OSP), Ambar (AMB), and two multimode adhesive systems: All-Bond Universal (ABU) and ScotchBond Universal (S...

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Autores principales: Carvalho, Ceci Nunes, Lanza, Marcos Daniel Septímio, Dourado, Letícia Gomes, Carvalho, Edilausson Moreno, Bauer, José
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Hindawi 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6487092/
https://www.ncbi.nlm.nih.gov/pubmed/31097965
http://dx.doi.org/10.1155/2019/5496784
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author Carvalho, Ceci Nunes
Lanza, Marcos Daniel Septímio
Dourado, Letícia Gomes
Carvalho, Edilausson Moreno
Bauer, José
author_facet Carvalho, Ceci Nunes
Lanza, Marcos Daniel Septímio
Dourado, Letícia Gomes
Carvalho, Edilausson Moreno
Bauer, José
author_sort Carvalho, Ceci Nunes
collection PubMed
description OBJECTIVES: This study evaluated the effect of air-drying time and light-curing time on the degree of conversion (DC) of three etch-and-rinse adhesive systems: ONE-STEP (OS) and ONE-STEP plus (OSP), Ambar (AMB), and two multimode adhesive systems: All-Bond Universal (ABU) and ScotchBond Universal (SBU) by Fourier transform infrared (FTIR) analysis. MATERIALS AND METHODS: The DC of each adhesive system was analyzed with six experimental different protocols: (1) immediate light curing for 10 s without solvent volatilization; (2) 10 s solvent volatilization with air stream plus 10 s light curing; (3) 60 s solvent volatilization with air stream plus 10 s light curing; (4) immediate light curing for 20 s without solvent volatilization; (5) 10 s solvent volatilization with air stream plus 20 s light curing; and (6) 60 s solvent volatilization with air stream plus 20 s light curing. FTIR spectra were obtained, and the DC was calculated by comparing the ratio of aliphatic/aromatic double carbon bonds before and after light activation (Bluephase 20i). The DC means were analyzed by three-way analysis of variance (ANOVA) and post hoc Tukey tests (α = 0.05). RESULTS: Three-way ANOVA showed statistically significant adhesive, air-drying, and light-cured time (p < 0.001). In general, there was a trend of increased DC when the adhesives were dried and cured for longer times, but that was not observed for all the adhesives tested. The acetone-based adhesive systems require an air-drying prior to light activation. The light-curing time of 20 s increases the DC of all materials tested. CONCLUSION: The results suggested that the DC of the adhesive systems tested was material dependent. In general, the protocol with solvent evaporation for 10 seconds with air syringe plus 20 seconds of light curing finds the high values of DC.
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spelling pubmed-64870922019-05-16 Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems Carvalho, Ceci Nunes Lanza, Marcos Daniel Septímio Dourado, Letícia Gomes Carvalho, Edilausson Moreno Bauer, José Int J Dent Research Article OBJECTIVES: This study evaluated the effect of air-drying time and light-curing time on the degree of conversion (DC) of three etch-and-rinse adhesive systems: ONE-STEP (OS) and ONE-STEP plus (OSP), Ambar (AMB), and two multimode adhesive systems: All-Bond Universal (ABU) and ScotchBond Universal (SBU) by Fourier transform infrared (FTIR) analysis. MATERIALS AND METHODS: The DC of each adhesive system was analyzed with six experimental different protocols: (1) immediate light curing for 10 s without solvent volatilization; (2) 10 s solvent volatilization with air stream plus 10 s light curing; (3) 60 s solvent volatilization with air stream plus 10 s light curing; (4) immediate light curing for 20 s without solvent volatilization; (5) 10 s solvent volatilization with air stream plus 20 s light curing; and (6) 60 s solvent volatilization with air stream plus 20 s light curing. FTIR spectra were obtained, and the DC was calculated by comparing the ratio of aliphatic/aromatic double carbon bonds before and after light activation (Bluephase 20i). The DC means were analyzed by three-way analysis of variance (ANOVA) and post hoc Tukey tests (α = 0.05). RESULTS: Three-way ANOVA showed statistically significant adhesive, air-drying, and light-cured time (p < 0.001). In general, there was a trend of increased DC when the adhesives were dried and cured for longer times, but that was not observed for all the adhesives tested. The acetone-based adhesive systems require an air-drying prior to light activation. The light-curing time of 20 s increases the DC of all materials tested. CONCLUSION: The results suggested that the DC of the adhesive systems tested was material dependent. In general, the protocol with solvent evaporation for 10 seconds with air syringe plus 20 seconds of light curing finds the high values of DC. Hindawi 2019-04-11 /pmc/articles/PMC6487092/ /pubmed/31097965 http://dx.doi.org/10.1155/2019/5496784 Text en Copyright © 2019 Ceci Nunes Carvalho et al. http://creativecommons.org/licenses/by/4.0/ This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Research Article
Carvalho, Ceci Nunes
Lanza, Marcos Daniel Septímio
Dourado, Letícia Gomes
Carvalho, Edilausson Moreno
Bauer, José
Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems
title Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems
title_full Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems
title_fullStr Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems
title_full_unstemmed Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems
title_short Impact of Solvent Evaporation and Curing Protocol on Degree of Conversion of Etch-and-Rinse and Multimode Adhesives Systems
title_sort impact of solvent evaporation and curing protocol on degree of conversion of etch-and-rinse and multimode adhesives systems
topic Research Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6487092/
https://www.ncbi.nlm.nih.gov/pubmed/31097965
http://dx.doi.org/10.1155/2019/5496784
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