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High-Resolution SEM and EDX Characterization of Deposits Formed by CH(4)+Ar DBD Plasma Processing in a Packed Bed Reactor
The deposits formed during the DBD plasma conversion of CH(4) were characterized by high-resolution scanning electron microscopy (HRSEM) and energy dispersive X-ray elemental analysis (EDX) for both cases of a non-packed reactor and a packed reactor. For the non-packed plasma reactor, a layer of dep...
Autores principales: | , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6523143/ https://www.ncbi.nlm.nih.gov/pubmed/30974810 http://dx.doi.org/10.3390/nano9040589 |
Sumario: | The deposits formed during the DBD plasma conversion of CH(4) were characterized by high-resolution scanning electron microscopy (HRSEM) and energy dispersive X-ray elemental analysis (EDX) for both cases of a non-packed reactor and a packed reactor. For the non-packed plasma reactor, a layer of deposits was formed on the dielectric surface. HRSEM images in combination with EDX and CHN elemental analysis of this layer revealed that the deposits are made of a polymer-like layer with a high content of hydrogen (60 at%), possessing an amorphous structure. For the packed reactor, γ-alumina, Pd/γ-alumina, BaTiO(3), silica-SBA-15, MgO/Al(2)O(3), and α-alumina were used as the packing materials inside the DBD discharges. Carbon-rich agglomerates were formed on the γ-alumina after exposure to plasma. The EDX mapping furthermore indicated the carbon-rich areas in the structure. In contrast, the formation of agglomerates was not observed for Pd-loaded γ-alumina. This was ascribed to the presence of Pd, which enhances the hydrogenation of deposit precursors, and leads to a significantly lower amount of deposits. It was further found that the structure of all other plasma-processed materials, including MgO/Al(2)O(3), silica-SBA-15, BaTiO(3), and α-alumina, undergoes morphological changes. These alterations appeared in the forms of the generation of new pores (voids) in the structure, as well as the moderation of the surface roughness towards a smoother surface after the plasma treatment. |
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