Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography

Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an...

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Detalles Bibliográficos
Autores principales: Valsecchi, Chiara, Gomez Armas, Luis Enrique, Weber de Menezes, Jacson
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2019
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6539013/
https://www.ncbi.nlm.nih.gov/pubmed/31083502
http://dx.doi.org/10.3390/s19092182

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6539013/
https://www.ncbi.nlm.nih.gov/pubmed/31083502
http://dx.doi.org/10.3390/s19092182

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