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UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts

The decomposition of toxic flotation reagents upon UV(185+254 nm) irradiation was attractive due to operational simplicity and no dosage of oxidants. In this work, the degradation of typical thiol collectors (potassium ethyl xanthate (PEX), sodium diethyl dithiocarbamate (SDD), O-isopropyl-N-ethyl t...

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Autores principales: Fu, Pingfeng, Li, Gen, Wu, Xiaoting, Lin, Xiaofeng, Lei, Bolan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6549947/
https://www.ncbi.nlm.nih.gov/pubmed/31218054
http://dx.doi.org/10.1098/rsos.190123
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author Fu, Pingfeng
Li, Gen
Wu, Xiaoting
Lin, Xiaofeng
Lei, Bolan
author_facet Fu, Pingfeng
Li, Gen
Wu, Xiaoting
Lin, Xiaofeng
Lei, Bolan
author_sort Fu, Pingfeng
collection PubMed
description The decomposition of toxic flotation reagents upon UV(185+254 nm) irradiation was attractive due to operational simplicity and no dosage of oxidants. In this work, the degradation of typical thiol collectors (potassium ethyl xanthate (PEX), sodium diethyl dithiocarbamate (SDD), O-isopropyl-N-ethyl thionocarbamate (IET) and dianilino dithiophoshoric acid (DDA)) was investigated by UV(185+254 nm) photolysis. The degradation efficiencies and mineralization extents of collectors were assessed. The formation of CS(2) and H(2)S byproducts was studied, and the mechanisms of collector degradation were proposed under UV(185+254 nm) irradiation. The PEX, SDD and IET were decomposed with nearly 100% removal upon 75 min of UV(185+254 nm) irradiation. The decomposition rate constants decreased in the order SDD > PEX > IET ≫ DDA, and the DDA was the refractory collector. After 120 min of UV(185+254 nm) irradiation, 15−45% of carbon and 25−75% of sulfur of collectors were completely mineralized, and the mineralization extent decreased in the order PEX > SDD > IET > DDA. The percentage of gaseous sulfur (CS(2) and H(2)S) ranged from 0.48 to 4.85% for four collectors, showing the fraction of emitted sulfur byproducts was small. The aqueous CS(2) concentration increased in the first 10−20 min, and was decreased to a low level of 0.05–0.1 mg l(−1) at 120 min. Two mechanisms, i.e. direct UV(254 nm) photolysis and indirect oxidation with free radicals, were responsible for collector decomposition in the UV(185+254 nm) photolysis.
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spelling pubmed-65499472019-06-19 UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts Fu, Pingfeng Li, Gen Wu, Xiaoting Lin, Xiaofeng Lei, Bolan R Soc Open Sci Chemistry The decomposition of toxic flotation reagents upon UV(185+254 nm) irradiation was attractive due to operational simplicity and no dosage of oxidants. In this work, the degradation of typical thiol collectors (potassium ethyl xanthate (PEX), sodium diethyl dithiocarbamate (SDD), O-isopropyl-N-ethyl thionocarbamate (IET) and dianilino dithiophoshoric acid (DDA)) was investigated by UV(185+254 nm) photolysis. The degradation efficiencies and mineralization extents of collectors were assessed. The formation of CS(2) and H(2)S byproducts was studied, and the mechanisms of collector degradation were proposed under UV(185+254 nm) irradiation. The PEX, SDD and IET were decomposed with nearly 100% removal upon 75 min of UV(185+254 nm) irradiation. The decomposition rate constants decreased in the order SDD > PEX > IET ≫ DDA, and the DDA was the refractory collector. After 120 min of UV(185+254 nm) irradiation, 15−45% of carbon and 25−75% of sulfur of collectors were completely mineralized, and the mineralization extent decreased in the order PEX > SDD > IET > DDA. The percentage of gaseous sulfur (CS(2) and H(2)S) ranged from 0.48 to 4.85% for four collectors, showing the fraction of emitted sulfur byproducts was small. The aqueous CS(2) concentration increased in the first 10−20 min, and was decreased to a low level of 0.05–0.1 mg l(−1) at 120 min. Two mechanisms, i.e. direct UV(254 nm) photolysis and indirect oxidation with free radicals, were responsible for collector decomposition in the UV(185+254 nm) photolysis. The Royal Society 2019-05-22 /pmc/articles/PMC6549947/ /pubmed/31218054 http://dx.doi.org/10.1098/rsos.190123 Text en © 2019 The Authors. http://creativecommons.org/licenses/by/4.0/ Published by the Royal Society under the terms of the Creative Commons Attribution License http://creativecommons.org/licenses/by/4.0/, which permits unrestricted use, provided the original author and source are credited.
spellingShingle Chemistry
Fu, Pingfeng
Li, Gen
Wu, Xiaoting
Lin, Xiaofeng
Lei, Bolan
UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
title UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
title_full UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
title_fullStr UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
title_full_unstemmed UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
title_short UV(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
title_sort uv(185+254 nm) photolysis of typical thiol collectors: decomposition efficiency, mineralization and formation of sulfur byproducts
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6549947/
https://www.ncbi.nlm.nih.gov/pubmed/31218054
http://dx.doi.org/10.1098/rsos.190123
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