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High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion
Heat management has become more and more critical, especially in miniaturized modern devices, so the exploration of highly thermally conductive materials with electrical insulation is of great importance. Here, we report that high-quality one-atom-thin hexagonal boron nitride (BN) has a thermal cond...
Autores principales: | , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Association for the Advancement of Science
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6555632/ https://www.ncbi.nlm.nih.gov/pubmed/31187056 http://dx.doi.org/10.1126/sciadv.aav0129 |
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author | Cai, Qiran Scullion, Declan Gan, Wei Falin, Alexey Zhang, Shunying Watanabe, Kenji Taniguchi, Takashi Chen, Ying Santos, Elton J. G. Li, Lu Hua |
author_facet | Cai, Qiran Scullion, Declan Gan, Wei Falin, Alexey Zhang, Shunying Watanabe, Kenji Taniguchi, Takashi Chen, Ying Santos, Elton J. G. Li, Lu Hua |
author_sort | Cai, Qiran |
collection | PubMed |
description | Heat management has become more and more critical, especially in miniaturized modern devices, so the exploration of highly thermally conductive materials with electrical insulation is of great importance. Here, we report that high-quality one-atom-thin hexagonal boron nitride (BN) has a thermal conductivity (κ) of 751 W/mK at room temperature, the second largest κ per unit weight among all semiconductors and insulators. The κ of atomically thin BN decreases with increased thickness. Our molecular dynamic simulations accurately reproduce this trend, and the density functional theory (DFT) calculations reveal the main scattering mechanism. The thermal expansion coefficients of monolayer to trilayer BN at 300 to 400 K are also experimentally measured for the first time. Owing to its wide bandgap, high thermal conductivity, outstanding strength, good flexibility, and excellent thermal and chemical stability, atomically thin BN is a strong candidate for heat dissipation applications, especially in the next generation of flexible electronic devices. |
format | Online Article Text |
id | pubmed-6555632 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | American Association for the Advancement of Science |
record_format | MEDLINE/PubMed |
spelling | pubmed-65556322019-06-11 High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion Cai, Qiran Scullion, Declan Gan, Wei Falin, Alexey Zhang, Shunying Watanabe, Kenji Taniguchi, Takashi Chen, Ying Santos, Elton J. G. Li, Lu Hua Sci Adv Research Articles Heat management has become more and more critical, especially in miniaturized modern devices, so the exploration of highly thermally conductive materials with electrical insulation is of great importance. Here, we report that high-quality one-atom-thin hexagonal boron nitride (BN) has a thermal conductivity (κ) of 751 W/mK at room temperature, the second largest κ per unit weight among all semiconductors and insulators. The κ of atomically thin BN decreases with increased thickness. Our molecular dynamic simulations accurately reproduce this trend, and the density functional theory (DFT) calculations reveal the main scattering mechanism. The thermal expansion coefficients of monolayer to trilayer BN at 300 to 400 K are also experimentally measured for the first time. Owing to its wide bandgap, high thermal conductivity, outstanding strength, good flexibility, and excellent thermal and chemical stability, atomically thin BN is a strong candidate for heat dissipation applications, especially in the next generation of flexible electronic devices. American Association for the Advancement of Science 2019-06-07 /pmc/articles/PMC6555632/ /pubmed/31187056 http://dx.doi.org/10.1126/sciadv.aav0129 Text en Copyright © 2019 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution License 4.0 (CC BY). http://creativecommons.org/licenses/by/4.0/ This is an open-access article distributed under the terms of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/4.0/) , which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. |
spellingShingle | Research Articles Cai, Qiran Scullion, Declan Gan, Wei Falin, Alexey Zhang, Shunying Watanabe, Kenji Taniguchi, Takashi Chen, Ying Santos, Elton J. G. Li, Lu Hua High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
title | High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
title_full | High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
title_fullStr | High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
title_full_unstemmed | High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
title_short | High thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
title_sort | high thermal conductivity of high-quality monolayer boron nitride and its thermal expansion |
topic | Research Articles |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6555632/ https://www.ncbi.nlm.nih.gov/pubmed/31187056 http://dx.doi.org/10.1126/sciadv.aav0129 |
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