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Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
Ruthenium (Ru) loaded catalysts are of significant interest for ammonia synthesis under mild reaction conditions. The B(5) sites have been reported as the active sites for ammonia formation, i.e., Ru with other coordinations were inactive, which has limited the utilization efficiency of Ru metal. Th...
Autores principales: | , , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Royal Society of Chemistry
2019
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6563781/ https://www.ncbi.nlm.nih.gov/pubmed/31293756 http://dx.doi.org/10.1039/c9sc01539f |
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author | Li, Jiang Wu, Jiazhen Wang, Haiyun Lu, Yangfan Ye, Tiannan Sasase, Masato Wu, Xiaojun Kitano, Masaaki Inoshita, Takeshi Hosono, Hideo |
author_facet | Li, Jiang Wu, Jiazhen Wang, Haiyun Lu, Yangfan Ye, Tiannan Sasase, Masato Wu, Xiaojun Kitano, Masaaki Inoshita, Takeshi Hosono, Hideo |
author_sort | Li, Jiang |
collection | PubMed |
description | Ruthenium (Ru) loaded catalysts are of significant interest for ammonia synthesis under mild reaction conditions. The B(5) sites have been reported as the active sites for ammonia formation, i.e., Ru with other coordinations were inactive, which has limited the utilization efficiency of Ru metal. The implantation of Ru into intermetallic compounds is considered to be a promising approach to tune the catalytic activity and utilization efficiency of Ru. Here we report an acid-durable electride, LnRuSi (Ln = La, Ce, Pr and Nd), as a B(5)-site-free Ru catalyst. The active Ru plane with a negative charge is selectively exposed by chemical etching using disodium dihydrogen ethylenediaminetetraacetate (EDTA-2Na) acid, which leads to 2–4-fold enhancement in the ammonia formation rate compared with that of the original catalyst. The turnover frequency (TOF) of LnRuSi is estimated to be approximately 0.06 s(–1), which is 600 times higher than that of pure Ru powder. Density functional theory (DFT) calculations revealed that the dissociation of N(2) occurs easily on the exposed Ru plane of LaRuSi. This systematic study provides firm evidence that layered Ru with a negative charge in LnRuSi is a new type of active site that differs significantly from B(5) sites. |
format | Online Article Text |
id | pubmed-6563781 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2019 |
publisher | Royal Society of Chemistry |
record_format | MEDLINE/PubMed |
spelling | pubmed-65637812019-07-10 Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching Li, Jiang Wu, Jiazhen Wang, Haiyun Lu, Yangfan Ye, Tiannan Sasase, Masato Wu, Xiaojun Kitano, Masaaki Inoshita, Takeshi Hosono, Hideo Chem Sci Chemistry Ruthenium (Ru) loaded catalysts are of significant interest for ammonia synthesis under mild reaction conditions. The B(5) sites have been reported as the active sites for ammonia formation, i.e., Ru with other coordinations were inactive, which has limited the utilization efficiency of Ru metal. The implantation of Ru into intermetallic compounds is considered to be a promising approach to tune the catalytic activity and utilization efficiency of Ru. Here we report an acid-durable electride, LnRuSi (Ln = La, Ce, Pr and Nd), as a B(5)-site-free Ru catalyst. The active Ru plane with a negative charge is selectively exposed by chemical etching using disodium dihydrogen ethylenediaminetetraacetate (EDTA-2Na) acid, which leads to 2–4-fold enhancement in the ammonia formation rate compared with that of the original catalyst. The turnover frequency (TOF) of LnRuSi is estimated to be approximately 0.06 s(–1), which is 600 times higher than that of pure Ru powder. Density functional theory (DFT) calculations revealed that the dissociation of N(2) occurs easily on the exposed Ru plane of LaRuSi. This systematic study provides firm evidence that layered Ru with a negative charge in LnRuSi is a new type of active site that differs significantly from B(5) sites. Royal Society of Chemistry 2019-05-03 /pmc/articles/PMC6563781/ /pubmed/31293756 http://dx.doi.org/10.1039/c9sc01539f Text en This journal is © The Royal Society of Chemistry 2019 https://creativecommons.org/licenses/by-nc/3.0/This article is freely available. This article is licensed under a Creative Commons Attribution Non Commercial 3.0 Unported Licence (CC BY-NC 3.0) |
spellingShingle | Chemistry Li, Jiang Wu, Jiazhen Wang, Haiyun Lu, Yangfan Ye, Tiannan Sasase, Masato Wu, Xiaojun Kitano, Masaaki Inoshita, Takeshi Hosono, Hideo Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching |
title | Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
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title_full | Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
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title_fullStr | Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
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title_full_unstemmed | Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
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title_short | Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
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title_sort | acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching |
topic | Chemistry |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6563781/ https://www.ncbi.nlm.nih.gov/pubmed/31293756 http://dx.doi.org/10.1039/c9sc01539f |
work_keys_str_mv | AT lijiang aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT wujiazhen aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT wanghaiyun aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT luyangfan aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT yetiannan aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT sasasemasato aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT wuxiaojun aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT kitanomasaaki aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT inoshitatakeshi aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching AT hosonohideo aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching |