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Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching

Ruthenium (Ru) loaded catalysts are of significant interest for ammonia synthesis under mild reaction conditions. The B(5) sites have been reported as the active sites for ammonia formation, i.e., Ru with other coordinations were inactive, which has limited the utilization efficiency of Ru metal. Th...

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Autores principales: Li, Jiang, Wu, Jiazhen, Wang, Haiyun, Lu, Yangfan, Ye, Tiannan, Sasase, Masato, Wu, Xiaojun, Kitano, Masaaki, Inoshita, Takeshi, Hosono, Hideo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Royal Society of Chemistry 2019
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6563781/
https://www.ncbi.nlm.nih.gov/pubmed/31293756
http://dx.doi.org/10.1039/c9sc01539f
_version_ 1783426610574131200
author Li, Jiang
Wu, Jiazhen
Wang, Haiyun
Lu, Yangfan
Ye, Tiannan
Sasase, Masato
Wu, Xiaojun
Kitano, Masaaki
Inoshita, Takeshi
Hosono, Hideo
author_facet Li, Jiang
Wu, Jiazhen
Wang, Haiyun
Lu, Yangfan
Ye, Tiannan
Sasase, Masato
Wu, Xiaojun
Kitano, Masaaki
Inoshita, Takeshi
Hosono, Hideo
author_sort Li, Jiang
collection PubMed
description Ruthenium (Ru) loaded catalysts are of significant interest for ammonia synthesis under mild reaction conditions. The B(5) sites have been reported as the active sites for ammonia formation, i.e., Ru with other coordinations were inactive, which has limited the utilization efficiency of Ru metal. The implantation of Ru into intermetallic compounds is considered to be a promising approach to tune the catalytic activity and utilization efficiency of Ru. Here we report an acid-durable electride, LnRuSi (Ln = La, Ce, Pr and Nd), as a B(5)-site-free Ru catalyst. The active Ru plane with a negative charge is selectively exposed by chemical etching using disodium dihydrogen ethylenediaminetetraacetate (EDTA-2Na) acid, which leads to 2–4-fold enhancement in the ammonia formation rate compared with that of the original catalyst. The turnover frequency (TOF) of LnRuSi is estimated to be approximately 0.06 s(–1), which is 600 times higher than that of pure Ru powder. Density functional theory (DFT) calculations revealed that the dissociation of N(2) occurs easily on the exposed Ru plane of LaRuSi. This systematic study provides firm evidence that layered Ru with a negative charge in LnRuSi is a new type of active site that differs significantly from B(5) sites.
format Online
Article
Text
id pubmed-6563781
institution National Center for Biotechnology Information
language English
publishDate 2019
publisher Royal Society of Chemistry
record_format MEDLINE/PubMed
spelling pubmed-65637812019-07-10 Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching Li, Jiang Wu, Jiazhen Wang, Haiyun Lu, Yangfan Ye, Tiannan Sasase, Masato Wu, Xiaojun Kitano, Masaaki Inoshita, Takeshi Hosono, Hideo Chem Sci Chemistry Ruthenium (Ru) loaded catalysts are of significant interest for ammonia synthesis under mild reaction conditions. The B(5) sites have been reported as the active sites for ammonia formation, i.e., Ru with other coordinations were inactive, which has limited the utilization efficiency of Ru metal. The implantation of Ru into intermetallic compounds is considered to be a promising approach to tune the catalytic activity and utilization efficiency of Ru. Here we report an acid-durable electride, LnRuSi (Ln = La, Ce, Pr and Nd), as a B(5)-site-free Ru catalyst. The active Ru plane with a negative charge is selectively exposed by chemical etching using disodium dihydrogen ethylenediaminetetraacetate (EDTA-2Na) acid, which leads to 2–4-fold enhancement in the ammonia formation rate compared with that of the original catalyst. The turnover frequency (TOF) of LnRuSi is estimated to be approximately 0.06 s(–1), which is 600 times higher than that of pure Ru powder. Density functional theory (DFT) calculations revealed that the dissociation of N(2) occurs easily on the exposed Ru plane of LaRuSi. This systematic study provides firm evidence that layered Ru with a negative charge in LnRuSi is a new type of active site that differs significantly from B(5) sites. Royal Society of Chemistry 2019-05-03 /pmc/articles/PMC6563781/ /pubmed/31293756 http://dx.doi.org/10.1039/c9sc01539f Text en This journal is © The Royal Society of Chemistry 2019 https://creativecommons.org/licenses/by-nc/3.0/This article is freely available. This article is licensed under a Creative Commons Attribution Non Commercial 3.0 Unported Licence (CC BY-NC 3.0)
spellingShingle Chemistry
Li, Jiang
Wu, Jiazhen
Wang, Haiyun
Lu, Yangfan
Ye, Tiannan
Sasase, Masato
Wu, Xiaojun
Kitano, Masaaki
Inoshita, Takeshi
Hosono, Hideo
Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
title Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
title_full Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
title_fullStr Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
title_full_unstemmed Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
title_short Acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
title_sort acid-durable electride with layered ruthenium for ammonia synthesis: boosting the activity via selective etching
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC6563781/
https://www.ncbi.nlm.nih.gov/pubmed/31293756
http://dx.doi.org/10.1039/c9sc01539f
work_keys_str_mv AT lijiang aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT wujiazhen aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT wanghaiyun aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT luyangfan aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT yetiannan aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT sasasemasato aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT wuxiaojun aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT kitanomasaaki aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT inoshitatakeshi aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching
AT hosonohideo aciddurableelectridewithlayeredrutheniumforammoniasynthesisboostingtheactivityviaselectiveetching